TY - JOUR
T1 - On optimum design of dislocation filters for reduction of misfit dislocations
AU - Maeda, K.
AU - Yamashita, Y.
AU - Fujita, K.
AU - Fukatsu, S.
AU - Suzuki, K.
AU - Mera, Y.
AU - Shiraki, Y.
N1 - Funding Information:
This work has been supported by a Grant-in-Aid for Scientific Research from the Japan Mm-istry of Education and Culture.
Copyright:
Copyright 2014 Elsevier B.V., All rights reserved.
PY - 1993/2/2
Y1 - 1993/2/2
N2 - A guide line is proposed to design efficient dislocation filters having modulus-modulated multilayer (MMML) structures strained in one direction. The central design concepts are (a) large blocking effect owing to MMML structure, (b) large sweeping effect owing to the use of MMML with built-in stresses in a common direction and stacked to a total thickness exceeding the multilayer critical thickness, and (c) filter thickness as large as possible to enhance the sweeping effect. Experimental results on a Si-Ge/Si heterostructure fabricated according to the guide line are presented.
AB - A guide line is proposed to design efficient dislocation filters having modulus-modulated multilayer (MMML) structures strained in one direction. The central design concepts are (a) large blocking effect owing to MMML structure, (b) large sweeping effect owing to the use of MMML with built-in stresses in a common direction and stacked to a total thickness exceeding the multilayer critical thickness, and (c) filter thickness as large as possible to enhance the sweeping effect. Experimental results on a Si-Ge/Si heterostructure fabricated according to the guide line are presented.
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U2 - 10.1016/0022-0248(93)90659-K
DO - 10.1016/0022-0248(93)90659-K
M3 - Article
AN - SCOPUS:0027904880
VL - 127
SP - 451
EP - 455
JO - Journal of Crystal Growth
JF - Journal of Crystal Growth
SN - 0022-0248
IS - 1-4
ER -