On optimum design of dislocation filters for reduction of misfit dislocations

K. Maeda, Y. Yamashita, K. Fujita, S. Fukatsu, K. Suzuki, Y. Mera, Y. Shiraki

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

A guide line is proposed to design efficient dislocation filters having modulus-modulated multilayer (MMML) structures strained in one direction. The central design concepts are (a) large blocking effect owing to MMML structure, (b) large sweeping effect owing to the use of MMML with built-in stresses in a common direction and stacked to a total thickness exceeding the multilayer critical thickness, and (c) filter thickness as large as possible to enhance the sweeping effect. Experimental results on a Si-Ge/Si heterostructure fabricated according to the guide line are presented.

Original languageEnglish
Pages (from-to)451-455
Number of pages5
JournalJournal of Crystal Growth
Volume127
Issue number1-4
DOIs
Publication statusPublished - Feb 2 1993
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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