Novel hydrophobic/hydrophilic patterning process by photocatalytic Ag nucleation on TiO 2 thin film and electroless Cu deposition

Shunsuke Nishimoto, Atsushi Kubo, Xintong Zhang, Zhaoyue Liu, Noriaki Taneichi, Toshiki Okui, Taketoshi Murakami, Takashi Komine, Akira Fujishima

Research output: Contribution to journalArticlepeer-review

30 Citations (Scopus)

Abstract

A hydrophobic/super-hydrophilic pattern was prepared on a TiO 2 thin film by a new fabrication process. The process consists of five key steps: (1) photocatalytic reduction of Ag + to Ag (nucleation), (2) electroless Cu deposition, (3) oxidation of Cu to CuO, (4) deposition of a self-assembled monolayer (SAM), and (5) photocatalytic decomposition of selected areas of the SAM. A hydrophobic/super-hydrophilic pattern with 500-μm 2 hydrophilic areas was obtained in this process. It is particularly noteworthy that a UV irradiation time of only 1 s was sufficient for the nucleation step in the patterning process.

Original languageEnglish
Pages (from-to)5891-5894
Number of pages4
JournalApplied Surface Science
Volume254
Issue number18
DOIs
Publication statusPublished - Jul 15 2008
Externally publishedYes

Keywords

  • Hydrophobic
  • Super-hydrophilic
  • Surface patterning
  • TiO photocatalyst

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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