New resist-coating technique using fine mist for three-dimensional nanotechnology

K. Yamazaki, H. Namatsu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We have devised a new resist-coating technique for three-dimensional (3D) substrates. The technique uses a quasi-static ambient of very fine mist and enables us to coat a resist film on a 3D substrate such as a cube. We found good conditions for obtaining a resist film with a uniform thickness and smooth surface and succeeded in coating polymethyl-methacrylate on a SiO 2Si cube. Moreover, electron-beam (EB) lithography on the cube resulted in similar patterns on each face of the top and side faces. This technique promises to enable 3D nanofabrication of various materials such as silicon with the resolution of EB lithography.

Original languageEnglish
Title of host publication19th IEEE International Conference on Micro Electro Mechanical Systems
Pages254-257
Number of pages4
Publication statusPublished - Oct 24 2006
Event19th IEEE International Conference on Micro Electro Mechanical Systems - Istanbul, Turkey
Duration: Jan 22 2006Jan 26 2006

Publication series

NameProceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
Volume2006
ISSN (Print)1084-6999

Other

Other19th IEEE International Conference on Micro Electro Mechanical Systems
CountryTurkey
CityIstanbul
Period1/22/061/26/06

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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  • Cite this

    Yamazaki, K., & Namatsu, H. (2006). New resist-coating technique using fine mist for three-dimensional nanotechnology. In 19th IEEE International Conference on Micro Electro Mechanical Systems (pp. 254-257). [1627784] (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS); Vol. 2006).