New development model: Aggregate extraction development

Toru Yamaguchi, Hideo Namatsu, Masao Nagase, Kenji Yamazaki, Kenji Kurihara

Research output: Chapter in Book/Report/Conference proceedingConference contribution

31 Citations (Scopus)

Abstract

We propose a new development model (Aggregate Extraction Model), which can explain the generation process of linewidth fluctuations. This model is inherently different from some previously proposed development models in that polymer aggregates, not a single polymer, are treated as the dissolution units. We found that the polymer aggregates about 20 - 30 nm in size are naturally contained in resist films. These aggregates can be observed in the cross section of a resist film and on the lightly exposed resist pattern surface after development. A polymer aggregate dissolves more slowly than the surrounding polymer probably because the polymer density is slightly higher inside the aggregate. Once the surrounding polymer dissolves, the aggregates are extracted and float away into the developer. The polymer aggregates trapped on the pattern sidewall, on the other hand, cause the roughness of the pattern size wall surface, which is responsible for the linewidth fluctuations. We have succeeded in a direct observation of aggregate extraction during the development by AFM observations. The validity of the Aggregate Extraction Model is also discussed from the point of view of the polymer density.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
Pages830-836
Number of pages7
Volume3333
DOIs
Publication statusPublished - 1998
Externally publishedYes
EventAdvances in Resist Technology and Processing XV - Santa Clara, CA, United States
Duration: Feb 23 1998Feb 23 1998

Other

OtherAdvances in Resist Technology and Processing XV
CountryUnited States
CitySanta Clara, CA
Period2/23/982/23/98

Fingerprint

Polymers
polymers
Resist
Model
Linewidth
Fluctuations
floats
Dissolution
photographic developers
Roughness
dissolving
Cross section
roughness
Surface roughness
atomic force microscopy
Unit
causes
cross sections

Keywords

  • Aggregate Extraction Model
  • Linewidth fluctuations
  • Polymer aggregates

ASJC Scopus subject areas

  • Applied Mathematics
  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Yamaguchi, T., Namatsu, H., Nagase, M., Yamazaki, K., & Kurihara, K. (1998). New development model: Aggregate extraction development. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 3333, pp. 830-836) https://doi.org/10.1117/12.312432

New development model : Aggregate extraction development. / Yamaguchi, Toru; Namatsu, Hideo; Nagase, Masao; Yamazaki, Kenji; Kurihara, Kenji.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3333 1998. p. 830-836.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Yamaguchi, T, Namatsu, H, Nagase, M, Yamazaki, K & Kurihara, K 1998, New development model: Aggregate extraction development. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 3333, pp. 830-836, Advances in Resist Technology and Processing XV, Santa Clara, CA, United States, 2/23/98. https://doi.org/10.1117/12.312432
Yamaguchi T, Namatsu H, Nagase M, Yamazaki K, Kurihara K. New development model: Aggregate extraction development. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3333. 1998. p. 830-836 https://doi.org/10.1117/12.312432
Yamaguchi, Toru ; Namatsu, Hideo ; Nagase, Masao ; Yamazaki, Kenji ; Kurihara, Kenji. / New development model : Aggregate extraction development. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3333 1998. pp. 830-836
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