Negative-Ion Production of Gas Material in RF-Plasma Sputter-Type Heavy Negative-Ion Source

Hiroshi Tsuji, Yoshio Okayama, Yoshitaka Toyota, Yasuhito Gotoh, Junzo Ishikawa

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)218-220
Number of pages3
JournalShinku
Volume38
Issue number3
DOIs
Publication statusPublished - 1995
Externally publishedYes

Fingerprint

Ion sources
Heavy ions
Negative ions
Gases
Plasmas

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

Cite this

Negative-Ion Production of Gas Material in RF-Plasma Sputter-Type Heavy Negative-Ion Source. / Tsuji, Hiroshi; Okayama, Yoshio; Toyota, Yoshitaka; Gotoh, Yasuhito; Ishikawa, Junzo.

In: Shinku, Vol. 38, No. 3, 1995, p. 218-220.

Research output: Contribution to journalArticle

Tsuji, Hiroshi ; Okayama, Yoshio ; Toyota, Yoshitaka ; Gotoh, Yasuhito ; Ishikawa, Junzo. / Negative-Ion Production of Gas Material in RF-Plasma Sputter-Type Heavy Negative-Ion Source. In: Shinku. 1995 ; Vol. 38, No. 3. pp. 218-220.
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