Negative-Ion Production of Gas Material in RF-Plasma Sputter-Type Heavy Negative-Ion Source

Hiroshi Tsuji, Yoshio Okayama, Yoshitaka Toyota, Yasuhito Gotoh, Junzo Ishikawa

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)218-220
Number of pages3
JournalShinku
Volume38
Issue number3
DOIs
Publication statusPublished - 1995
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

Cite this