Nanoscopic distribution of potential and topography on Si (111) surface having 1 × 1 and 7 × 7 structures with and without scratching

Keiji Nakayama, Tadashi Shiota

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The distribution of potential has been investigated for Si (111) surfaces having 1 × 1 and 7 × 7 structures with and without scratching. It was measured using scanning Kelvin probe force microscopy combined with non-contact atomic force microscopy in an ultrahigh vacuum. Potential images display nanoscopic structures related to surface atomic structures, so we can distinguish 1 × 1 and 7 × 7 structures and scratched surfaces even when the topographical difference is negligible. Oxygen adsorption greatly changes the surface potential and the extent of the difference depends on the surface atomic structure.

Original languageEnglish
Pages (from-to)885-888
Number of pages4
JournalSurface and Interface Analysis
Volume40
Issue number3-4
DOIs
Publication statusPublished - Mar 2008

Keywords

  • SKPM
  • Scratching
  • Si (111)
  • Surface potential
  • Topography

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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