Linewidth fluctuation in resist patterns is a serious problem in electron beam nanolithography. We have observed granular structures with a diameter of 20-30 nm in resist films, and have determined that these structures cause the linewidth fluctuations. The granules are made up of polymer aggregates. We discuss the origin of the aggregates from the result that their size depends on the polymer molecular weight. We also show that the linewidth fluctuation is reduced, though the developing rate is slow, when the pattern size is less than the aggregate size. The linewidth dependence of the fluctuation and of the developing rate can be explained by the influence of the resist polymer aggregate on the development behavior.
|Number of pages||3|
|Journal||Applied Physics Letters|
|Publication status||Published - Oct 20 1997|
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)