TY - JOUR
T1 - N-channel field effect transistors with fullerene thin films and their application to a logic gate circuit
AU - Kanbara, T.
AU - Shibata, K.
AU - Fujiki, S.
AU - Kubozono, Y.
AU - Kashino, S.
AU - Urisu, T.
AU - Sakai, M.
AU - Fujiwara, A.
AU - Kumashiro, R.
AU - Tanigaki, K.
N1 - Funding Information:
This work has been supported by the Joint Studies Program (2001–2002) of the Institute for Molecular Science. The authors appreciate financial support from CREST of Japan Science and Technology Corporation.
PY - 2003/9/26
Y1 - 2003/9/26
N2 - N-channel field effect transistors (FETs) were fabricated with thin films of C60 and Dy@C82. A typical enhancement-type FET property was observed in C60 FET above 220 K. The mobility of C 60 FET increased with increasing temperature. This fact suggests hopping transport as the conduction mechanism, with the activation energy of 0.29 eV. The Dy@C82 FET was found to be a normally-on type FET, which has a property different from that for C60 and C70 FETs. A complementary metal oxide semiconductor (CMOS) logic gate circuit was first fabricated with C60 and pentacene thin-film FETs.
AB - N-channel field effect transistors (FETs) were fabricated with thin films of C60 and Dy@C82. A typical enhancement-type FET property was observed in C60 FET above 220 K. The mobility of C 60 FET increased with increasing temperature. This fact suggests hopping transport as the conduction mechanism, with the activation energy of 0.29 eV. The Dy@C82 FET was found to be a normally-on type FET, which has a property different from that for C60 and C70 FETs. A complementary metal oxide semiconductor (CMOS) logic gate circuit was first fabricated with C60 and pentacene thin-film FETs.
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U2 - 10.1016/j.cplett.2003.07.025
DO - 10.1016/j.cplett.2003.07.025
M3 - Article
AN - SCOPUS:0141570408
SN - 0009-2614
VL - 379
SP - 223
EP - 229
JO - Chemical Physics Letters
JF - Chemical Physics Letters
IS - 3-4
ER -