Multilayer graphene/amorphous carbon hybrid films prepared by microwave surface-wave plasma CVD

Synthesis and characterization

Susumu Ichimura, Yasuhiko Hayashi, Masayoshi Umeno

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Hybrid films of multilayer graphene (MG) containing amorphous carbon (a-C) were synthesized on Al substrates by microwave surface-wave plasma chemical vapor deposition. Raman scattering and surface transmission electron microscopy showed that the carbon films contained a large quantity of MG when a radio frequency (RF) substrate bias was not applied. Amorphization of graphene in the carbon film was promoted by applying an RF bias, which generated Ar+ in the plasma. The bandgaps of the films were found to increase as the Raman intensity ratios between the 2D-band (at 2700cm-1) and D-band (at 1350cm-1) decreased, indicating the formation of a-C. The MG/a-C all-sp2 phase of carbon hybrid films exhibited an increase in current density under 5mW/cm2 of AM1.5G solar simulated irradiation as the RF bias increased because of Ar+-induced amorphization of the graphene.

Original languageEnglish
JournalSurface and Interface Analysis
DOIs
Publication statusAccepted/In press - 2016

Fingerprint

Plasma CVD
Graphite
Amorphous carbon
Surface waves
Graphene
surface waves
graphene
Multilayers
Microwaves
vapor deposition
microwaves
carbon
synthesis
radio frequencies
Amorphization
Carbon films
Plasmas
Substrates
Raman scattering
Chemical vapor deposition

Keywords

  • Amorphous carbon
  • Graphene
  • Hybrid carbon film
  • Microwave surface-wave plasma CVD
  • Raman
  • Transmission electron microscopy (TEM)

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

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title = "Multilayer graphene/amorphous carbon hybrid films prepared by microwave surface-wave plasma CVD: Synthesis and characterization",
abstract = "Hybrid films of multilayer graphene (MG) containing amorphous carbon (a-C) were synthesized on Al substrates by microwave surface-wave plasma chemical vapor deposition. Raman scattering and surface transmission electron microscopy showed that the carbon films contained a large quantity of MG when a radio frequency (RF) substrate bias was not applied. Amorphization of graphene in the carbon film was promoted by applying an RF bias, which generated Ar+ in the plasma. The bandgaps of the films were found to increase as the Raman intensity ratios between the 2D-band (at 2700cm-1) and D-band (at 1350cm-1) decreased, indicating the formation of a-C. The MG/a-C all-sp2 phase of carbon hybrid films exhibited an increase in current density under 5mW/cm2 of AM1.5G solar simulated irradiation as the RF bias increased because of Ar+-induced amorphization of the graphene.",
keywords = "Amorphous carbon, Graphene, Hybrid carbon film, Microwave surface-wave plasma CVD, Raman, Transmission electron microscopy (TEM)",
author = "Susumu Ichimura and Yasuhiko Hayashi and Masayoshi Umeno",
year = "2016",
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language = "English",
journal = "Surface and Interface Analysis",
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publisher = "John Wiley and Sons Ltd",

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T1 - Multilayer graphene/amorphous carbon hybrid films prepared by microwave surface-wave plasma CVD

T2 - Synthesis and characterization

AU - Ichimura, Susumu

AU - Hayashi, Yasuhiko

AU - Umeno, Masayoshi

PY - 2016

Y1 - 2016

N2 - Hybrid films of multilayer graphene (MG) containing amorphous carbon (a-C) were synthesized on Al substrates by microwave surface-wave plasma chemical vapor deposition. Raman scattering and surface transmission electron microscopy showed that the carbon films contained a large quantity of MG when a radio frequency (RF) substrate bias was not applied. Amorphization of graphene in the carbon film was promoted by applying an RF bias, which generated Ar+ in the plasma. The bandgaps of the films were found to increase as the Raman intensity ratios between the 2D-band (at 2700cm-1) and D-band (at 1350cm-1) decreased, indicating the formation of a-C. The MG/a-C all-sp2 phase of carbon hybrid films exhibited an increase in current density under 5mW/cm2 of AM1.5G solar simulated irradiation as the RF bias increased because of Ar+-induced amorphization of the graphene.

AB - Hybrid films of multilayer graphene (MG) containing amorphous carbon (a-C) were synthesized on Al substrates by microwave surface-wave plasma chemical vapor deposition. Raman scattering and surface transmission electron microscopy showed that the carbon films contained a large quantity of MG when a radio frequency (RF) substrate bias was not applied. Amorphization of graphene in the carbon film was promoted by applying an RF bias, which generated Ar+ in the plasma. The bandgaps of the films were found to increase as the Raman intensity ratios between the 2D-band (at 2700cm-1) and D-band (at 1350cm-1) decreased, indicating the formation of a-C. The MG/a-C all-sp2 phase of carbon hybrid films exhibited an increase in current density under 5mW/cm2 of AM1.5G solar simulated irradiation as the RF bias increased because of Ar+-induced amorphization of the graphene.

KW - Amorphous carbon

KW - Graphene

KW - Hybrid carbon film

KW - Microwave surface-wave plasma CVD

KW - Raman

KW - Transmission electron microscopy (TEM)

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