Multilayer graphene/amorphous carbon hybrid films prepared by microwave surface-wave plasma CVD: Synthesis and characterization

Susumu Ichimura, Yasuhiko Hayashi, Masayoshi Umeno

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Hybrid films of multilayer graphene (MG) containing amorphous carbon (a-C) were synthesized on Al substrates by microwave surface-wave plasma chemical vapor deposition. Raman scattering and surface transmission electron microscopy showed that the carbon films contained a large quantity of MG when a radio frequency (RF) substrate bias was not applied. Amorphization of graphene in the carbon film was promoted by applying an RF bias, which generated Ar+ in the plasma. The bandgaps of the films were found to increase as the Raman intensity ratios between the 2D-band (at 2700cm-1) and D-band (at 1350cm-1) decreased, indicating the formation of a-C. The MG/a-C all-sp2 phase of carbon hybrid films exhibited an increase in current density under 5mW/cm2 of AM1.5G solar simulated irradiation as the RF bias increased because of Ar+-induced amorphization of the graphene.

Original languageEnglish
JournalSurface and Interface Analysis
DOIs
Publication statusAccepted/In press - 2016

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Keywords

  • Amorphous carbon
  • Graphene
  • Hybrid carbon film
  • Microwave surface-wave plasma CVD
  • Raman
  • Transmission electron microscopy (TEM)

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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