Molecular mechanisms of stress resistance of photosynthetic apparatus

V. D. Kreslavski, R. Carpentier, V. V. Klimov, N. Murata, Suleyman Allakhverdiev

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

The mechanisms of action of environmental stress-inducing factors on plant photosynthetic apparatus (PA) are considered. The basic targets of stress produced by heat, cold, salt, osmotic imbalance, and light of high intensity are analyzed. It has been suggested that the stress factors have an influence first of all on the composition of thylakoid membranes and inhibit photosynthetic processes. However, recent studies demonstrated that strong light induces the photodamage to photosystem II (PSII) due to direct action of light on the oxygen-evolving complex, whereas accumulation of reactive oxygen species during the stress leads to inhibition of the recovery of the PSII by suppressing the synthesis of proteins in photosynthesis de novo. Such stressful environments as moderately high and low temperatures and salt suppress the repair of photodamaged PSII by inhibiting the synthesis of photosynthetic proteins de novo as well. On the other hand, the synthesis of protective lowmolecular compounds and stress proteins is stimulated. The main mechanisms of the PA acclimation and its protection from the damaging and inhibiting action of the environmental stress factors under light of different intensities are considered. Special attention is paid to investigations using cell cultures and mutants.

Original languageEnglish
Pages (from-to)195-217
Number of pages23
JournalBiologicheskie Membrany
Volume24
Issue number3
Publication statusPublished - Aug 1 2007
Externally publishedYes

Fingerprint

Photosystem II Protein Complex
Light
Salts
Thylakoids
Acclimatization
Photosynthesis
Heat-Shock Proteins
Reactive Oxygen Species
Proteins
Cell Culture Techniques
Hot Temperature
Oxygen
Temperature

ASJC Scopus subject areas

  • Molecular Biology
  • Cell Biology

Cite this

Kreslavski, V. D., Carpentier, R., Klimov, V. V., Murata, N., & Allakhverdiev, S. (2007). Molecular mechanisms of stress resistance of photosynthetic apparatus. Biologicheskie Membrany, 24(3), 195-217.

Molecular mechanisms of stress resistance of photosynthetic apparatus. / Kreslavski, V. D.; Carpentier, R.; Klimov, V. V.; Murata, N.; Allakhverdiev, Suleyman.

In: Biologicheskie Membrany, Vol. 24, No. 3, 01.08.2007, p. 195-217.

Research output: Contribution to journalArticle

Kreslavski, VD, Carpentier, R, Klimov, VV, Murata, N & Allakhverdiev, S 2007, 'Molecular mechanisms of stress resistance of photosynthetic apparatus', Biologicheskie Membrany, vol. 24, no. 3, pp. 195-217.
Kreslavski VD, Carpentier R, Klimov VV, Murata N, Allakhverdiev S. Molecular mechanisms of stress resistance of photosynthetic apparatus. Biologicheskie Membrany. 2007 Aug 1;24(3):195-217.
Kreslavski, V. D. ; Carpentier, R. ; Klimov, V. V. ; Murata, N. ; Allakhverdiev, Suleyman. / Molecular mechanisms of stress resistance of photosynthetic apparatus. In: Biologicheskie Membrany. 2007 ; Vol. 24, No. 3. pp. 195-217.
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