Modulation of young's modulus of poly(methyl methacrylate) nanobeam due to electron-beam exposure

Kenji Yamazaki, Toru Yamaguchi, Hiroshi Yamaguchi

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We fabricated suspended poly(methyl methacrylate) (PMMA) micro/nanobeams using a novel two-step development process. Young's moduli measured for the fabricated beams were found to decrease with additional electron-beam (EB) exposure. This means that we can locally control Young's modulus in PMMA structure using EB exposure and thus effectively design nanoelectromechanical systems using this organic material. The effect was more significant for smaller beams, suggesting that the modulus of the near-surface region is largely affected.

Original languageEnglish
Pages (from-to)L1225-L1227
JournalJapanese Journal of Applied Physics, Part 2: Letters
Issue number45-49
Publication statusPublished - Dec 14 2007



  • EB exposure
  • EB lithography
  • Elastic modulus
  • NEMS
  • Nanomechanics
  • Nanostructure
  • PMMA

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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