Modification of the physical properties of chemical vapor-deposited nanostructure diamond by argon-hydrogen plasma surface treatment

Y. Hayashi; D. Mori; T. Soga; T. Jimbo

doi:10.1134/1.1711461

Modification of the physical properties of chemical vapor-deposited nanostructure diamond by argon-hydrogen plasma surface treatment

Y. Hayashi, D. Mori, T. Soga, T. Jimbo

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

Nanostructure diamond (NSD) film with a hardness as high as 70 GPa and an average surface roughness of 10 nm has been synthesized by the two-step negative substrate bias method combined with postgrowth Ar-H₂ plasma irradiation. The Ar-H₂ plasma irradiation has been confirmed to improve the uniformity of grain size and shape and increase the hardness of the NSD film.

Original language	English
Pages (from-to)	733-737
Number of pages	5
Journal	Physics of the Solid State
Volume	46
Issue number	4
DOIs	https://doi.org/10.1134/1.1711461
Publication status	Published - Apr 2004
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

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title = "Modification of the physical properties of chemical vapor-deposited nanostructure diamond by argon-hydrogen plasma surface treatment",

abstract = "Nanostructure diamond (NSD) film with a hardness as high as 70 GPa and an average surface roughness of 10 nm has been synthesized by the two-step negative substrate bias method combined with postgrowth Ar-H2 plasma irradiation. The Ar-H2 plasma irradiation has been confirmed to improve the uniformity of grain size and shape and increase the hardness of the NSD film.",

author = "Y. Hayashi and D. Mori and T. Soga and T. Jimbo",

note = "Funding Information: This work was partly supported by the Research Foundation for the Electrotechnology of Chubu (REFEC), the Daiko Foundation, and the NITECH 21st Century COE Program “World Ceramics Center for Environmental Harmony.” Copyright: Copyright 2008 Elsevier B.V., All rights reserved.",

year = "2004",

month = apr,

doi = "10.1134/1.1711461",

language = "English",

volume = "46",

pages = "733--737",

journal = "Physics of the Solid State",

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AU - Hayashi, Y.

AU - Mori, D.

AU - Soga, T.

AU - Jimbo, T.

N1 - Funding Information: This work was partly supported by the Research Foundation for the Electrotechnology of Chubu (REFEC), the Daiko Foundation, and the NITECH 21st Century COE Program “World Ceramics Center for Environmental Harmony.” Copyright: Copyright 2008 Elsevier B.V., All rights reserved.

PY - 2004/4

Y1 - 2004/4

N2 - Nanostructure diamond (NSD) film with a hardness as high as 70 GPa and an average surface roughness of 10 nm has been synthesized by the two-step negative substrate bias method combined with postgrowth Ar-H2 plasma irradiation. The Ar-H2 plasma irradiation has been confirmed to improve the uniformity of grain size and shape and increase the hardness of the NSD film.

AB - Nanostructure diamond (NSD) film with a hardness as high as 70 GPa and an average surface roughness of 10 nm has been synthesized by the two-step negative substrate bias method combined with postgrowth Ar-H2 plasma irradiation. The Ar-H2 plasma irradiation has been confirmed to improve the uniformity of grain size and shape and increase the hardness of the NSD film.

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SN - 1063-7834

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Modification of the physical properties of chemical vapor-deposited nanostructure diamond by argon-hydrogen plasma surface treatment

Abstract

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