Abstract
Nanostructure diamond (NSD) film with a hardness as high as 70 GPa and an average surface roughness of 10 nm has been synthesized by the two-step negative substrate bias method combined with postgrowth Ar-H2 plasma irradiation. The Ar-H2 plasma irradiation has been confirmed to improve the uniformity of grain size and shape and increase the hardness of the NSD film.
| Original language | English |
|---|---|
| Pages (from-to) | 733-737 |
| Number of pages | 5 |
| Journal | Physics of the Solid State |
| Volume | 46 |
| Issue number | 4 |
| DOIs | |
| Publication status | Published - Apr 1 2004 |
| Externally published | Yes |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
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Cite this
Hayashi, Y., Mori, D., Soga, T., & Jimbo, T. (2004). Modification of the physical properties of chemical vapor-deposited nanostructure diamond by argon-hydrogen plasma surface treatment. Physics of the Solid State, 46(4), 733-737. https://doi.org/10.1134/1.1711461