Abstract
Nanostructure diamond (NSD) film with a hardness as high as 70 GPa and an average surface roughness of 10 nm has been synthesized by the two-step negative substrate bias method combined with postgrowth Ar-H2 plasma irradiation. The Ar-H2 plasma irradiation has been confirmed to improve the uniformity of grain size and shape and increase the hardness of the NSD film.
Original language | English |
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Pages (from-to) | 733-737 |
Number of pages | 5 |
Journal | Physics of the Solid State |
Volume | 46 |
Issue number | 4 |
DOIs | |
Publication status | Published - Apr 2004 |
Externally published | Yes |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics