Modification of the physical properties of chemical vapor-deposited nanostructure diamond by argon-hydrogen plasma surface treatment

Y. Hayashi, D. Mori, T. Soga, T. Jimbo

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Nanostructure diamond (NSD) film with a hardness as high as 70 GPa and an average surface roughness of 10 nm has been synthesized by the two-step negative substrate bias method combined with postgrowth Ar-H2 plasma irradiation. The Ar-H2 plasma irradiation has been confirmed to improve the uniformity of grain size and shape and increase the hardness of the NSD film.

Original languageEnglish
Pages (from-to)733-737
Number of pages5
JournalPhysics of the Solid State
Volume46
Issue number4
DOIs
Publication statusPublished - Apr 1 2004
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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