Modification of the physical properties of chemical vapor-deposited nanostructure diamond by argon-hydrogen plasma surface treatment

Yasuhiko Hayashi, D. Mori, T. Soga, T. Jimbo

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Nanostructure diamond (NSD) film with a hardness as high as 70 GPa and an average surface roughness of 10 nm has been synthesized by the two-step negative substrate bias method combined with postgrowth Ar-H2 plasma irradiation. The Ar-H2 plasma irradiation has been confirmed to improve the uniformity of grain size and shape and increase the hardness of the NSD film.

Original languageEnglish
Pages (from-to)733-737
Number of pages5
JournalPhysics of the Solid State
Volume46
Issue number4
DOIs
Publication statusPublished - Apr 2004
Externally publishedYes

Fingerprint

Diamond
Argon
Diamond films
argon plasma
hydrogen plasma
surface treatment
diamond films
Surface treatment
Hydrogen
Nanostructures
Diamonds
hardness
Physical properties
physical properties
Hardness
diamonds
Grain size and shape
Vapors
Irradiation
vapors

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electronic, Optical and Magnetic Materials

Cite this

Modification of the physical properties of chemical vapor-deposited nanostructure diamond by argon-hydrogen plasma surface treatment. / Hayashi, Yasuhiko; Mori, D.; Soga, T.; Jimbo, T.

In: Physics of the Solid State, Vol. 46, No. 4, 04.2004, p. 733-737.

Research output: Contribution to journalArticle

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