Modification of the physical properties of chemical vapor-deposited nanostructure diamond by argon-hydrogen plasma surface treatment

Y. Hayashi; D. Mori; T. Soga; T. Jimbo

doi:10.1134/1.1711461

Modification of the physical properties of chemical vapor-deposited nanostructure diamond by argon-hydrogen plasma surface treatment

Y. Hayashi, D. Mori, T. Soga, T. Jimbo

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

Nanostructure diamond (NSD) film with a hardness as high as 70 GPa and an average surface roughness of 10 nm has been synthesized by the two-step negative substrate bias method combined with postgrowth Ar-H₂ plasma irradiation. The Ar-H₂ plasma irradiation has been confirmed to improve the uniformity of grain size and shape and increase the hardness of the NSD film.

Original language	English
Pages (from-to)	733-737
Number of pages	5
Journal	Physics of the Solid State
Volume	46
Issue number	4
DOIs	https://doi.org/10.1134/1.1711461
Publication status	Published - Apr 1 2004
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

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abstract = "Nanostructure diamond (NSD) film with a hardness as high as 70 GPa and an average surface roughness of 10 nm has been synthesized by the two-step negative substrate bias method combined with postgrowth Ar-H2 plasma irradiation. The Ar-H2 plasma irradiation has been confirmed to improve the uniformity of grain size and shape and increase the hardness of the NSD film.",

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AU - Jimbo, T.

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