Modeling of the atomic processes in the laser-plasma EUV sources

Sasaki; K. Nishihara; F. Koike; K. Kagawa; H. Tanuma; A. Sunahara; K. Gamada; T. Nishikawa

doi:10.1117/12.602029

Modeling of the atomic processes in the laser-plasma EUV sources

Sasaki, K. Nishihara, F. Koike, K. Kagawa, H. Tanuma, A. Sunahara, K. Gamada, T. Nishikawa

Research output: Contribution to journal › Conference article › peer-review

Abstract

We develop an atomic model for the Xe and Sn plasmas based on the calculated atomic data for the theoretical investigatiion of the laser plasma EUV source. The wavelength and intensity of the emission lines of Xe ^8-16+ and Sn^4-12+ are investigated, and the dominant charge state and emission channels for the radiation at 13.5 nm are identified. The emissivity and opacity at the collisional radiative equilibrium (CRE) are calculated, and their spectral properties are investigated with respect to the accuracy of the wavelength of major emission lines and the effect of satellite lines.

Original language	English
Article number	115
Pages (from-to)	935-942
Number of pages	8
Journal	Progress in Biomedical Optics and Imaging - Proceedings of SPIE
Volume	5751
Issue number	II
DOIs	https://doi.org/10.1117/12.602029
Publication status	Published - Sept 19 2005
Event	Emerging Lithographic Technologies IX - San Jose, CA, United States Duration: Mar 1 2005 → Mar 3 2005

Keywords

Atomic process
Emissivity
EUV lithography
Opacity
Plasma spectroscopy
Simulation

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Biomaterials
Atomic and Molecular Physics, and Optics
Radiology Nuclear Medicine and imaging

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10.1117/12.602029

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title = "Modeling of the atomic processes in the laser-plasma EUV sources",

abstract = "We develop an atomic model for the Xe and Sn plasmas based on the calculated atomic data for the theoretical investigatiion of the laser plasma EUV source. The wavelength and intensity of the emission lines of Xe 8-16+ and Sn4-12+ are investigated, and the dominant charge state and emission channels for the radiation at 13.5 nm are identified. The emissivity and opacity at the collisional radiative equilibrium (CRE) are calculated, and their spectral properties are investigated with respect to the accuracy of the wavelength of major emission lines and the effect of satellite lines.",

keywords = "Atomic process, Emissivity, EUV lithography, Opacity, Plasma spectroscopy, Simulation",

author = "Sasaki and K. Nishihara and F. Koike and K. Kagawa and H. Tanuma and A. Sunahara and K. Gamada and T. Nishikawa",

year = "2005",

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T1 - Modeling of the atomic processes in the laser-plasma EUV sources

AU - Sasaki,

AU - Nishihara, K.

AU - Koike, F.

AU - Kagawa, K.

AU - Tanuma, H.

AU - Sunahara, A.

AU - Gamada, K.

AU - Nishikawa, T.

PY - 2005/9/19

Y1 - 2005/9/19

N2 - We develop an atomic model for the Xe and Sn plasmas based on the calculated atomic data for the theoretical investigatiion of the laser plasma EUV source. The wavelength and intensity of the emission lines of Xe 8-16+ and Sn4-12+ are investigated, and the dominant charge state and emission channels for the radiation at 13.5 nm are identified. The emissivity and opacity at the collisional radiative equilibrium (CRE) are calculated, and their spectral properties are investigated with respect to the accuracy of the wavelength of major emission lines and the effect of satellite lines.

AB - We develop an atomic model for the Xe and Sn plasmas based on the calculated atomic data for the theoretical investigatiion of the laser plasma EUV source. The wavelength and intensity of the emission lines of Xe 8-16+ and Sn4-12+ are investigated, and the dominant charge state and emission channels for the radiation at 13.5 nm are identified. The emissivity and opacity at the collisional radiative equilibrium (CRE) are calculated, and their spectral properties are investigated with respect to the accuracy of the wavelength of major emission lines and the effect of satellite lines.

KW - Atomic process

KW - Emissivity

KW - EUV lithography

KW - Opacity

KW - Plasma spectroscopy

KW - Simulation

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DO - 10.1117/12.602029

M3 - Conference article

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VL - 5751

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EP - 942

JO - Progress in Biomedical Optics and Imaging - Proceedings of SPIE

JF - Progress in Biomedical Optics and Imaging - Proceedings of SPIE

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M1 - 115

T2 - Emerging Lithographic Technologies IX

Y2 - 1 March 2005 through 3 March 2005

ER -

Modeling of the atomic processes in the laser-plasma EUV sources

Abstract

Keywords

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