Modeling of the atomic processes in the laser-plasma EUV sources

Sasaki, K. Nishihara, F. Koike, K. Kagawa, H. Tanuma, A. Sunahara, K. Gamada, Takeshi Nishikawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We develop an atomic model for the Xe and Sn plasmas based on the calculated atomic data for the theoretical investigatiion of the laser plasma EUV source. The wavelength and intensity of the emission lines of Xe 8-16+ and Sn4-12+ are investigated, and the dominant charge state and emission channels for the radiation at 13.5 nm are identified. The emissivity and opacity at the collisional radiative equilibrium (CRE) are calculated, and their spectral properties are investigated with respect to the accuracy of the wavelength of major emission lines and the effect of satellite lines.

Original languageEnglish
Title of host publicationProgress in Biomedical Optics and Imaging - Proceedings of SPIE
EditorsR.S. Mackay
Pages935-942
Number of pages8
Volume5751
EditionII
DOIs
Publication statusPublished - 2005
EventEmerging Lithographic Technologies IX - San Jose, CA, United States
Duration: Mar 1 2005Mar 3 2005

Other

OtherEmerging Lithographic Technologies IX
CountryUnited States
CitySan Jose, CA
Period3/1/053/3/05

Fingerprint

Plasmas
Wavelength
Lasers
Opacity
Satellites
Radiation

Keywords

  • Atomic process
  • Emissivity
  • EUV lithography
  • Opacity
  • Plasma spectroscopy
  • Simulation

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Sasaki, Nishihara, K., Koike, F., Kagawa, K., Tanuma, H., Sunahara, A., ... Nishikawa, T. (2005). Modeling of the atomic processes in the laser-plasma EUV sources. In R. S. Mackay (Ed.), Progress in Biomedical Optics and Imaging - Proceedings of SPIE (II ed., Vol. 5751, pp. 935-942). [115] https://doi.org/10.1117/12.602029

Modeling of the atomic processes in the laser-plasma EUV sources. / Sasaki; Nishihara, K.; Koike, F.; Kagawa, K.; Tanuma, H.; Sunahara, A.; Gamada, K.; Nishikawa, Takeshi.

Progress in Biomedical Optics and Imaging - Proceedings of SPIE. ed. / R.S. Mackay. Vol. 5751 II. ed. 2005. p. 935-942 115.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Sasaki, Nishihara, K, Koike, F, Kagawa, K, Tanuma, H, Sunahara, A, Gamada, K & Nishikawa, T 2005, Modeling of the atomic processes in the laser-plasma EUV sources. in RS Mackay (ed.), Progress in Biomedical Optics and Imaging - Proceedings of SPIE. II edn, vol. 5751, 115, pp. 935-942, Emerging Lithographic Technologies IX, San Jose, CA, United States, 3/1/05. https://doi.org/10.1117/12.602029
Sasaki, Nishihara K, Koike F, Kagawa K, Tanuma H, Sunahara A et al. Modeling of the atomic processes in the laser-plasma EUV sources. In Mackay RS, editor, Progress in Biomedical Optics and Imaging - Proceedings of SPIE. II ed. Vol. 5751. 2005. p. 935-942. 115 https://doi.org/10.1117/12.602029
Sasaki ; Nishihara, K. ; Koike, F. ; Kagawa, K. ; Tanuma, H. ; Sunahara, A. ; Gamada, K. ; Nishikawa, Takeshi. / Modeling of the atomic processes in the laser-plasma EUV sources. Progress in Biomedical Optics and Imaging - Proceedings of SPIE. editor / R.S. Mackay. Vol. 5751 II. ed. 2005. pp. 935-942
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