Modeling of initial interaction between the laser pulse and Sn droplet target and pre-plasma formation for the LPP EUV source

Akira Sasaki, Katsunobu Nishihara, Atushi Sunahara, Hiroyuki Furukawa, Takeshi Nishikawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We develop a new simulation code for the optimization of efficiency of the laser pumped plasma (LPP) extreme ultra violet (EUV) light source, which is applicable to the pre-plasma formation from a tin droplet target irradiated by a pre-pulse laser. We investigate algorithms of reorganization of the mesh for the Lagrangian hydrodynamics simulation. We also investigate the model of the liquid to gas phase transition to calculate the dynamics of particle formation through the laser ablation.

Original languageEnglish
Title of host publicationExtreme Ultraviolet (EUV) Lithography VII
PublisherSPIE
Volume9776
ISBN (Electronic)9781510600119
DOIs
Publication statusPublished - 2016
EventExtreme Ultraviolet (EUV) Lithography VII - San Jose, United States
Duration: Feb 22 2016Feb 25 2016

Other

OtherExtreme Ultraviolet (EUV) Lithography VII
CountryUnited States
CitySan Jose
Period2/22/162/25/16

Fingerprint

Ultraviolet
Droplet
Laser pulses
Extremes
Plasma
Laser
Plasmas
Laser Ablation
Target
Tin
Lasers
Laser ablation
pulses
Interaction
Modeling
ultraviolet radiation
laser ablation
lasers
Light sources
mesh

Keywords

  • EUV source
  • hydrodynamics
  • laser produced plasma
  • modeling
  • simulation

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Sasaki, A., Nishihara, K., Sunahara, A., Furukawa, H., & Nishikawa, T. (2016). Modeling of initial interaction between the laser pulse and Sn droplet target and pre-plasma formation for the LPP EUV source. In Extreme Ultraviolet (EUV) Lithography VII (Vol. 9776). [97762C] SPIE. https://doi.org/10.1117/12.2219045

Modeling of initial interaction between the laser pulse and Sn droplet target and pre-plasma formation for the LPP EUV source. / Sasaki, Akira; Nishihara, Katsunobu; Sunahara, Atushi; Furukawa, Hiroyuki; Nishikawa, Takeshi.

Extreme Ultraviolet (EUV) Lithography VII. Vol. 9776 SPIE, 2016. 97762C.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Sasaki, A, Nishihara, K, Sunahara, A, Furukawa, H & Nishikawa, T 2016, Modeling of initial interaction between the laser pulse and Sn droplet target and pre-plasma formation for the LPP EUV source. in Extreme Ultraviolet (EUV) Lithography VII. vol. 9776, 97762C, SPIE, Extreme Ultraviolet (EUV) Lithography VII, San Jose, United States, 2/22/16. https://doi.org/10.1117/12.2219045
Sasaki A, Nishihara K, Sunahara A, Furukawa H, Nishikawa T. Modeling of initial interaction between the laser pulse and Sn droplet target and pre-plasma formation for the LPP EUV source. In Extreme Ultraviolet (EUV) Lithography VII. Vol. 9776. SPIE. 2016. 97762C https://doi.org/10.1117/12.2219045
Sasaki, Akira ; Nishihara, Katsunobu ; Sunahara, Atushi ; Furukawa, Hiroyuki ; Nishikawa, Takeshi. / Modeling of initial interaction between the laser pulse and Sn droplet target and pre-plasma formation for the LPP EUV source. Extreme Ultraviolet (EUV) Lithography VII. Vol. 9776 SPIE, 2016.
@inproceedings{27f61282a8ef4aa7aaa2415b69638871,
title = "Modeling of initial interaction between the laser pulse and Sn droplet target and pre-plasma formation for the LPP EUV source",
abstract = "We develop a new simulation code for the optimization of efficiency of the laser pumped plasma (LPP) extreme ultra violet (EUV) light source, which is applicable to the pre-plasma formation from a tin droplet target irradiated by a pre-pulse laser. We investigate algorithms of reorganization of the mesh for the Lagrangian hydrodynamics simulation. We also investigate the model of the liquid to gas phase transition to calculate the dynamics of particle formation through the laser ablation.",
keywords = "EUV source, hydrodynamics, laser produced plasma, modeling, simulation",
author = "Akira Sasaki and Katsunobu Nishihara and Atushi Sunahara and Hiroyuki Furukawa and Takeshi Nishikawa",
year = "2016",
doi = "10.1117/12.2219045",
language = "English",
volume = "9776",
booktitle = "Extreme Ultraviolet (EUV) Lithography VII",
publisher = "SPIE",
address = "United States",

}

TY - GEN

T1 - Modeling of initial interaction between the laser pulse and Sn droplet target and pre-plasma formation for the LPP EUV source

AU - Sasaki, Akira

AU - Nishihara, Katsunobu

AU - Sunahara, Atushi

AU - Furukawa, Hiroyuki

AU - Nishikawa, Takeshi

PY - 2016

Y1 - 2016

N2 - We develop a new simulation code for the optimization of efficiency of the laser pumped plasma (LPP) extreme ultra violet (EUV) light source, which is applicable to the pre-plasma formation from a tin droplet target irradiated by a pre-pulse laser. We investigate algorithms of reorganization of the mesh for the Lagrangian hydrodynamics simulation. We also investigate the model of the liquid to gas phase transition to calculate the dynamics of particle formation through the laser ablation.

AB - We develop a new simulation code for the optimization of efficiency of the laser pumped plasma (LPP) extreme ultra violet (EUV) light source, which is applicable to the pre-plasma formation from a tin droplet target irradiated by a pre-pulse laser. We investigate algorithms of reorganization of the mesh for the Lagrangian hydrodynamics simulation. We also investigate the model of the liquid to gas phase transition to calculate the dynamics of particle formation through the laser ablation.

KW - EUV source

KW - hydrodynamics

KW - laser produced plasma

KW - modeling

KW - simulation

UR - http://www.scopus.com/inward/record.url?scp=84981311987&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84981311987&partnerID=8YFLogxK

U2 - 10.1117/12.2219045

DO - 10.1117/12.2219045

M3 - Conference contribution

VL - 9776

BT - Extreme Ultraviolet (EUV) Lithography VII

PB - SPIE

ER -