Modeling of atomic processes of multiple charged ions in plasmas and its application to the study of EUV light sources

Akira Sasaki, Katsunobu Nishihara, Atsushi Sunahara, Hiroyuki Furukawa, Takeshi Nishikawa, Fumihiro Koike

Research output: Contribution to journalArticlepeer-review

Abstract

Atomic processes of multiple-charged ions of high-Z elements from tin to dysprosium are investigated for their application to light sources for extreme-ultra-violet (EUV) lithography. Modeling of these ions in plasmas, including tungsten, which is being considered for use as a divertor and wall material in the fusion devices, is discussed. Atomic spectra become very complex in the case of low-charged ions below Pd-like ions, which calls for a new atomic code for calculating the energy levels and rate coefficients of collisional and radiative processes. The collisional radiative model is validated through code comparison workshop activities. An alternative method for investigating the formation of the non-uniform structure of the plasmas is also presented.

Original languageEnglish
Article number2402145
JournalPlasma and Fusion Research
Volume6
Issue number1 SPECIAL ISSUE
DOIs
Publication statusPublished - Dec 1 2011

Keywords

  • Atomic process
  • EUV
  • Lithography
  • Radiative transfer

ASJC Scopus subject areas

  • Condensed Matter Physics

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