Modeling of atomic and plasmas processes in the LPP and LA-DPP EUV source

Akira Sasaki, Katsunobu Nishihara, Atsushi Sunahara, Hiroyuki Furukawa, Takeshi Nishikawa, Fumihiro Koike

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We show an atomic model of Sn for the EUV sources. We show an improvement of the model in terms of the selection of energy levels and correction of the wavelength of the emission lines including resonance and satellite lines of combined 4d-4f and 4p-4d transition arrays. Calculated spectrum agrees well with experiments, showing that the present model is useful both for theoretical investigation of the optimum conditions the EUV sources, and for the analysis of experimental spectrum. A modeling method to estimate the initial spatial profile of the discharge path for the analysis of laser-assisted discharge pumped plasma sources is also proposed.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
Volume7636
DOIs
Publication statusPublished - 2010
EventExtreme Ultraviolet (EUV) Lithography - San Jose, CA, United States
Duration: Feb 22 2010Feb 25 2010

Other

OtherExtreme Ultraviolet (EUV) Lithography
CountryUnited States
CitySan Jose, CA
Period2/22/102/25/10

Fingerprint

EUV Source
Plasma
Plasmas
Modeling
Plasma sources
Line
Energy Levels
Modeling Method
resonance lines
Electron energy levels
energy levels
Satellites
Model
Wavelength
Laser
Path
Lasers
estimates
profiles
wavelengths

ASJC Scopus subject areas

  • Applied Mathematics
  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Sasaki, A., Nishihara, K., Sunahara, A., Furukawa, H., Nishikawa, T., & Koike, F. (2010). Modeling of atomic and plasmas processes in the LPP and LA-DPP EUV source. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 7636). [76363D] https://doi.org/10.1117/12.846467

Modeling of atomic and plasmas processes in the LPP and LA-DPP EUV source. / Sasaki, Akira; Nishihara, Katsunobu; Sunahara, Atsushi; Furukawa, Hiroyuki; Nishikawa, Takeshi; Koike, Fumihiro.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 7636 2010. 76363D.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Sasaki, A, Nishihara, K, Sunahara, A, Furukawa, H, Nishikawa, T & Koike, F 2010, Modeling of atomic and plasmas processes in the LPP and LA-DPP EUV source. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 7636, 76363D, Extreme Ultraviolet (EUV) Lithography, San Jose, CA, United States, 2/22/10. https://doi.org/10.1117/12.846467
Sasaki A, Nishihara K, Sunahara A, Furukawa H, Nishikawa T, Koike F. Modeling of atomic and plasmas processes in the LPP and LA-DPP EUV source. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 7636. 2010. 76363D https://doi.org/10.1117/12.846467
Sasaki, Akira ; Nishihara, Katsunobu ; Sunahara, Atsushi ; Furukawa, Hiroyuki ; Nishikawa, Takeshi ; Koike, Fumihiro. / Modeling of atomic and plasmas processes in the LPP and LA-DPP EUV source. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 7636 2010.
@inproceedings{91eec798c6b54415b0a083d3b93384dd,
title = "Modeling of atomic and plasmas processes in the LPP and LA-DPP EUV source",
abstract = "We show an atomic model of Sn for the EUV sources. We show an improvement of the model in terms of the selection of energy levels and correction of the wavelength of the emission lines including resonance and satellite lines of combined 4d-4f and 4p-4d transition arrays. Calculated spectrum agrees well with experiments, showing that the present model is useful both for theoretical investigation of the optimum conditions the EUV sources, and for the analysis of experimental spectrum. A modeling method to estimate the initial spatial profile of the discharge path for the analysis of laser-assisted discharge pumped plasma sources is also proposed.",
author = "Akira Sasaki and Katsunobu Nishihara and Atsushi Sunahara and Hiroyuki Furukawa and Takeshi Nishikawa and Fumihiro Koike",
year = "2010",
doi = "10.1117/12.846467",
language = "English",
isbn = "9780819480507",
volume = "7636",
booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

}

TY - GEN

T1 - Modeling of atomic and plasmas processes in the LPP and LA-DPP EUV source

AU - Sasaki, Akira

AU - Nishihara, Katsunobu

AU - Sunahara, Atsushi

AU - Furukawa, Hiroyuki

AU - Nishikawa, Takeshi

AU - Koike, Fumihiro

PY - 2010

Y1 - 2010

N2 - We show an atomic model of Sn for the EUV sources. We show an improvement of the model in terms of the selection of energy levels and correction of the wavelength of the emission lines including resonance and satellite lines of combined 4d-4f and 4p-4d transition arrays. Calculated spectrum agrees well with experiments, showing that the present model is useful both for theoretical investigation of the optimum conditions the EUV sources, and for the analysis of experimental spectrum. A modeling method to estimate the initial spatial profile of the discharge path for the analysis of laser-assisted discharge pumped plasma sources is also proposed.

AB - We show an atomic model of Sn for the EUV sources. We show an improvement of the model in terms of the selection of energy levels and correction of the wavelength of the emission lines including resonance and satellite lines of combined 4d-4f and 4p-4d transition arrays. Calculated spectrum agrees well with experiments, showing that the present model is useful both for theoretical investigation of the optimum conditions the EUV sources, and for the analysis of experimental spectrum. A modeling method to estimate the initial spatial profile of the discharge path for the analysis of laser-assisted discharge pumped plasma sources is also proposed.

UR - http://www.scopus.com/inward/record.url?scp=77953467052&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77953467052&partnerID=8YFLogxK

U2 - 10.1117/12.846467

DO - 10.1117/12.846467

M3 - Conference contribution

AN - SCOPUS:77953467052

SN - 9780819480507

VL - 7636

BT - Proceedings of SPIE - The International Society for Optical Engineering

ER -