Low-damage milling of an amino acid thin film with cluster ion beam

Masaki Hada, Sachi Ibuki, Yusaku Hontani, Yasuyuki Yamamoto, Kazuya Ichiki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

In this work, we characterized the surface damage layer and sputtering yield of polycrystalline L-leucine films before and after irradiation with Ar cluster or monomer ion beams with x ray photoelectron spectroscopy and ellipsometry. Irradiation with Ar monomer ion beams induced heavy damage on the surface of L-leucine films, such as bond breaking and carbonization. In contrast, no significant surface damage was observed in the films irradiated with Ar cluster ion beams. The sputtering yield of L-leucine decreased dramatically with increasing fluence of monomer Ar ions and approached the value of the sputtering yield of graphite; but under irradiation with Ar cluster ion beams, the sputtering yield remained constant with fluence. The differences in sputtering yield behavior were explained in relation with the surface damage layer on organic materials. Thus, cluster ion beams could potentially be used to mill down biological materials without significant damage on the surface and could contribute to various applications in the analysis and processing of life matter.

Original languageEnglish
Article number094701
JournalJournal of Applied Physics
Volume110
Issue number9
DOIs
Publication statusPublished - Nov 1 2011

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Low-damage milling of an amino acid thin film with cluster ion beam'. Together they form a unique fingerprint.

  • Cite this

    Hada, M., Ibuki, S., Hontani, Y., Yamamoto, Y., Ichiki, K., Ninomiya, S., Seki, T., Aoki, T., & Matsuo, J. (2011). Low-damage milling of an amino acid thin film with cluster ion beam. Journal of Applied Physics, 110(9), [094701]. https://doi.org/10.1063/1.3658220