In situ positioning of a few hundred micrometer-sized cleaved surfaces for soft-x-ray angle-resolved photoemission spectroscopy by use of an optical microscope

Takayuki Muro, Yukako Kato, Tomohiro Matsushita, Toyohiko Kinoshita, Yoshio Watanabe, Akira Sekiyama, Hiroshi Sugiyama, Masato Kimura, Satoshi Komori, Shigemasa Suga, Hiroyuki Okazaki, Takayoshi Yokoya

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Abstract

A method to position samples with small cleaved regions has been developed to be applied to the angle-resolved photoemission spectroscopy (ARPES) which uses soft-x-ray synchrotron radiation focused down to 160×180 μ m 2. A long-working-distance optical microscope is used for the sample observation. A selected region on a sample can be optimally set at the position of measurements, which is realized by the spatial resolution of the photoelectron analyzer. Using this method, electronic band dispersions of bulk silicon have been measured by ARPES for a partially cleaved region with a size of ∼200×500 μ m2.

Original languageEnglish
Article number053901
JournalReview of Scientific Instruments
Volume80
Issue number5
DOIs
Publication statusPublished - Jun 11 2009

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ASJC Scopus subject areas

  • Instrumentation

Cite this

Muro, T., Kato, Y., Matsushita, T., Kinoshita, T., Watanabe, Y., Sekiyama, A., Sugiyama, H., Kimura, M., Komori, S., Suga, S., Okazaki, H., & Yokoya, T. (2009). In situ positioning of a few hundred micrometer-sized cleaved surfaces for soft-x-ray angle-resolved photoemission spectroscopy by use of an optical microscope. Review of Scientific Instruments, 80(5), [053901]. https://doi.org/10.1063/1.3124145