Improvement of crystallinity and surface roughness in epitaxial CeO₂/Ce_1-xZrxO₂/Y_0.15Zr_0.85O_1.93 buffer layers deposited on a Si(100) substrate by pulsed laser deposition

Engineering & Materials Science

• Buffer layers 92%
• Cerium oxide 82%
• Crystallinity 78%
• Surface roughness 53%
• Substrates 45%
• Lattice constants 27%
• Epitaxial films 14%
• Full width at half maximum 13%

Chemical Compounds

• Pulsed Laser Deposition 85%
• Surface Roughness 64%
• Crystallinity 49%
• Buffer Solution 41%
• Lattice Parameter 41%
• Epitaxial Film 30%
• Liquid Film 20%
• Reflection 17%

Physics & Astronomy

• yttria-stabilized zirconia 70%
• pulsed laser deposition 61%
• crystallinity 57%
• surface roughness 54%
• buffers 54%
• lattice parameters 14%