TY - GEN
T1 - Implementation of a dual disturbance observer for pneumatic stage
AU - Santo, Yoshiki
AU - Nakamura, Yukinori
AU - Wakui, Shinji
PY - 2012/11/27
Y1 - 2012/11/27
N2 - This paper treats a pneumatic stage used in semiconductor exposure apparatus as a research subject. Pneumatic positioning is slow due to the compressibility of air. Moreover, there are several causes that prevent the high-precision positioning. In particular, the flow disturbance induced by the air pipe supplying compressed air, and the mechanical disturbance generated by rolling guide are the main cause. This paper proposes "Dual Disturbance Observer" as a method of removing two disturbances to realize high-precision positioning.
AB - This paper treats a pneumatic stage used in semiconductor exposure apparatus as a research subject. Pneumatic positioning is slow due to the compressibility of air. Moreover, there are several causes that prevent the high-precision positioning. In particular, the flow disturbance induced by the air pipe supplying compressed air, and the mechanical disturbance generated by rolling guide are the main cause. This paper proposes "Dual Disturbance Observer" as a method of removing two disturbances to realize high-precision positioning.
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M3 - Conference contribution
AN - SCOPUS:84869747042
SN - 9780955529382
T3 - 2012 International Conference onAdvanced Mechatronic Systems, ICAMechS 2012
SP - 241
EP - 246
BT - 2012 International Conference onAdvanced Mechatronic Systems, ICAMechS 2012
T2 - 2012 International Conference onAdvanced Mechatronic Systems, ICAMechS 2012
Y2 - 18 September 2012 through 21 September 2012
ER -