Implementation of a dual disturbance observer for pneumatic stage

Yoshiki Santo, Yukinori Nakamura, Shinji Wakui

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

This paper treats a pneumatic stage used in semiconductor exposure apparatus as a research subject. Pneumatic positioning is slow due to the compressibility of air. Moreover, there are several causes that prevent the high-precision positioning. In particular, the flow disturbance induced by the air pipe supplying compressed air, and the mechanical disturbance generated by rolling guide are the main cause. This paper proposes "Dual Disturbance Observer" as a method of removing two disturbances to realize high-precision positioning.

Original languageEnglish
Title of host publication2012 International Conference onAdvanced Mechatronic Systems, ICAMechS 2012
Pages241-246
Number of pages6
Publication statusPublished - Nov 27 2012
Externally publishedYes
Event2012 International Conference onAdvanced Mechatronic Systems, ICAMechS 2012 - Tokyo, Japan
Duration: Sep 18 2012Sep 21 2012

Publication series

Name2012 International Conference onAdvanced Mechatronic Systems, ICAMechS 2012

Other

Other2012 International Conference onAdvanced Mechatronic Systems, ICAMechS 2012
CountryJapan
CityTokyo
Period9/18/129/21/12

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Mechanical Engineering

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  • Cite this

    Santo, Y., Nakamura, Y., & Wakui, S. (2012). Implementation of a dual disturbance observer for pneumatic stage. In 2012 International Conference onAdvanced Mechatronic Systems, ICAMechS 2012 (pp. 241-246). [6329717] (2012 International Conference onAdvanced Mechatronic Systems, ICAMechS 2012).