Hydrostatic pressure response of an oxide-based two-dimensional electron system

J. Zabaleta, V. S. Borisov, R. Wanke, Harald Olaf Jeschke, S. C. Parks, B. Baum, A. Teker, T. Harada, K. Syassen, T. Kopp, N. Pavlenko, R. Valentí, J. Mannhart

Research output: Contribution to journalArticle

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Abstract

Two-dimensional electron systems with fascinating properties exist in multilayers of standard semiconductors, on helium surfaces, and in oxides. Compared to the two-dimensional (2D) electron gases of semiconductors, the 2D electron systems in oxides are typically more strongly correlated and more sensitive to the microscopic structure of the hosting lattice. This sensitivity suggests that the oxide 2D systems are highly tunable by hydrostatic pressure. Here we explore the effects of hydrostatic pressure on the well-characterized 2D electron system formed at LaAlO3-SrTiO3 interfaces [A. Ohtomo and H. Y. Hwang, Nature (London) 427, 423 (2004)NATUAS0028-083610.1038/nature02308] and measure a pronounced, unexpected response. Pressure of ∼2 GPa reversibly doubles the 2D carrier density ns at 4 K. Along with the increase of ns, the conductivity and mobility are reduced under pressure. First-principles pressure simulations reveal the same behavior of the carrier density and suggest a possible mechanism of the mobility reduction, based on the dielectric properties of both materials and their variation under external pressure.

Original languageEnglish
Article number235117
JournalPhysical Review B
Volume93
Issue number23
DOIs
Publication statusPublished - Jun 8 2016
Externally publishedYes

Fingerprint

Hydrostatic pressure
hydrostatic pressure
Oxides
oxides
Electrons
Carrier concentration
electrons
Semiconductor materials
Helium
Two dimensional electron gas
Dielectric properties
electron gas
dielectric properties
Multilayers
helium
conductivity
sensitivity
simulation

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

Zabaleta, J., Borisov, V. S., Wanke, R., Jeschke, H. O., Parks, S. C., Baum, B., ... Mannhart, J. (2016). Hydrostatic pressure response of an oxide-based two-dimensional electron system. Physical Review B, 93(23), [235117]. https://doi.org/10.1103/PhysRevB.93.235117

Hydrostatic pressure response of an oxide-based two-dimensional electron system. / Zabaleta, J.; Borisov, V. S.; Wanke, R.; Jeschke, Harald Olaf; Parks, S. C.; Baum, B.; Teker, A.; Harada, T.; Syassen, K.; Kopp, T.; Pavlenko, N.; Valentí, R.; Mannhart, J.

In: Physical Review B, Vol. 93, No. 23, 235117, 08.06.2016.

Research output: Contribution to journalArticle

Zabaleta, J, Borisov, VS, Wanke, R, Jeschke, HO, Parks, SC, Baum, B, Teker, A, Harada, T, Syassen, K, Kopp, T, Pavlenko, N, Valentí, R & Mannhart, J 2016, 'Hydrostatic pressure response of an oxide-based two-dimensional electron system', Physical Review B, vol. 93, no. 23, 235117. https://doi.org/10.1103/PhysRevB.93.235117
Zabaleta, J. ; Borisov, V. S. ; Wanke, R. ; Jeschke, Harald Olaf ; Parks, S. C. ; Baum, B. ; Teker, A. ; Harada, T. ; Syassen, K. ; Kopp, T. ; Pavlenko, N. ; Valentí, R. ; Mannhart, J. / Hydrostatic pressure response of an oxide-based two-dimensional electron system. In: Physical Review B. 2016 ; Vol. 93, No. 23.
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