Hydrogen plasma treatment for Si waveguide smoothing

Jingnan Cai, Yu Wang, Yasuhiko Ishikawa, Yoshifumi Yamashita, Yoichi Kamiura, Kazumi Wada

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We demonstrated that remote hydrogen plasma treatment on silicon ring resonators can smooth the Si waveguides at lower than 100°C. This also provides a promising way to trim resonators for a designed add/drop wavelength.

Original languageEnglish
Title of host publication8th IEEE International Conference on Group IV Photonics, GFP 2011
Pages95-97
Number of pages3
DOIs
Publication statusPublished - Nov 22 2011
Event8th IEEE International Conference on Group IV Photonics, GFP 2011 - London, United Kingdom
Duration: Sep 14 2011Sep 16 2011

Publication series

NameIEEE International Conference on Group IV Photonics GFP
ISSN (Print)1949-2081

Other

Other8th IEEE International Conference on Group IV Photonics, GFP 2011
CountryUnited Kingdom
CityLondon
Period9/14/119/16/11

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials

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  • Cite this

    Cai, J., Wang, Y., Ishikawa, Y., Yamashita, Y., Kamiura, Y., & Wada, K. (2011). Hydrogen plasma treatment for Si waveguide smoothing. In 8th IEEE International Conference on Group IV Photonics, GFP 2011 (pp. 95-97). [6053727] (IEEE International Conference on Group IV Photonics GFP). https://doi.org/10.1109/GROUP4.2011.6053727