Hydrogen plasma treatment for Si waveguide smoothing

Jingnan Cai, Yu Wang, Yasuhiko Ishikawa, Yoshifumi Yamashita, Yoichi Kamiura, Kazumi Wada

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We demonstrated that remote hydrogen plasma treatment on silicon ring resonators can smooth the Si waveguides at lower than 100°C. This also provides a promising way to trim resonators for a designed add/drop wavelength.

Original languageEnglish
Title of host publicationIEEE International Conference on Group IV Photonics GFP
Pages95-97
Number of pages3
DOIs
Publication statusPublished - 2011
Event8th IEEE International Conference on Group IV Photonics, GFP 2011 - London, United Kingdom
Duration: Sep 14 2011Sep 16 2011

Other

Other8th IEEE International Conference on Group IV Photonics, GFP 2011
CountryUnited Kingdom
CityLondon
Period9/14/119/16/11

Fingerprint

Resonators
Hydrogen
Waveguides
Plasmas
Silicon
Wavelength

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials

Cite this

Cai, J., Wang, Y., Ishikawa, Y., Yamashita, Y., Kamiura, Y., & Wada, K. (2011). Hydrogen plasma treatment for Si waveguide smoothing. In IEEE International Conference on Group IV Photonics GFP (pp. 95-97). [6053727] https://doi.org/10.1109/GROUP4.2011.6053727

Hydrogen plasma treatment for Si waveguide smoothing. / Cai, Jingnan; Wang, Yu; Ishikawa, Yasuhiko; Yamashita, Yoshifumi; Kamiura, Yoichi; Wada, Kazumi.

IEEE International Conference on Group IV Photonics GFP. 2011. p. 95-97 6053727.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Cai, J, Wang, Y, Ishikawa, Y, Yamashita, Y, Kamiura, Y & Wada, K 2011, Hydrogen plasma treatment for Si waveguide smoothing. in IEEE International Conference on Group IV Photonics GFP., 6053727, pp. 95-97, 8th IEEE International Conference on Group IV Photonics, GFP 2011, London, United Kingdom, 9/14/11. https://doi.org/10.1109/GROUP4.2011.6053727
Cai J, Wang Y, Ishikawa Y, Yamashita Y, Kamiura Y, Wada K. Hydrogen plasma treatment for Si waveguide smoothing. In IEEE International Conference on Group IV Photonics GFP. 2011. p. 95-97. 6053727 https://doi.org/10.1109/GROUP4.2011.6053727
Cai, Jingnan ; Wang, Yu ; Ishikawa, Yasuhiko ; Yamashita, Yoshifumi ; Kamiura, Yoichi ; Wada, Kazumi. / Hydrogen plasma treatment for Si waveguide smoothing. IEEE International Conference on Group IV Photonics GFP. 2011. pp. 95-97
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