High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas

Christopher S.A. Musgrave, Takehiro Murakami, Teruyuki Ugomori, Kensuke Yoshida, Shinsuke Fujioka, Hiroaki Nishimura, Hironori Atarashi, Tomokazu Iyoda, Keiji Nagai

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

With the advent of high volume manufacturing capabilities by extreme ultraviolet lithography, constant improvements in light source design and cost-efficiency are required. Currently, light intensity and conversion efficiency (CE) measurments are obtained by charged couple devices, faraday cups etc, but also phoshpor imaging plates (IPs) (BaFBr:Eu). IPs are sensitive to light and high-energy species, which is ideal for studying extreme ultraviolet (EUV) light from laser produced plasmas (LPPs). In this work, we used IPs to observe a large angular distribution (10°-90°). We ablated a tin target by high-energy lasers (1064 nm Nd:YAG, 1010 and 1011 W/cm2) to generate the EUV light. The europium ions in the IP were trapped in a higher energy state from exposure to EUV light and high-energy species. The light intensity was angular dependent; therefore excitation of the IP depends on the angle, and so highly informative about the LPP. We obtained high-space resolution (345 μm, 0.2°) angular distribution and grazing spectrometer (5-20 nm grate) data simultaneously at different target to IP distances (103 mm and 200 mm). Two laser systems and IP types (BAS-TR and BAS-SR) were also compared. The cosine fitting values from the IP data were used to calculate the CE to be 1.6% (SD ± 0.2) at 13.5 nm 2% bandwidth. Finally, a practical assessment of IPs and a damage issue are disclosed.

Original languageEnglish
Article number033506
JournalReview of Scientific Instruments
Volume88
Issue number3
DOIs
Publication statusPublished - Mar 1 2017

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Laser produced plasmas
laser plasmas
ultraviolet radiation
Tin
tin
Imaging techniques
Angular distribution
luminous intensity
Conversion efficiency
angular distribution
High energy lasers
Ultraviolet Rays
Extreme ultraviolet lithography
energy
Europium
grazing
europium
yttrium-aluminum garnet
Electron energy levels
lasers

ASJC Scopus subject areas

  • Instrumentation

Cite this

Musgrave, C. S. A., Murakami, T., Ugomori, T., Yoshida, K., Fujioka, S., Nishimura, H., ... Nagai, K. (2017). High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas. Review of Scientific Instruments, 88(3), [033506]. https://doi.org/10.1063/1.4978526

High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas. / Musgrave, Christopher S.A.; Murakami, Takehiro; Ugomori, Teruyuki; Yoshida, Kensuke; Fujioka, Shinsuke; Nishimura, Hiroaki; Atarashi, Hironori; Iyoda, Tomokazu; Nagai, Keiji.

In: Review of Scientific Instruments, Vol. 88, No. 3, 033506, 01.03.2017.

Research output: Contribution to journalArticle

Musgrave, CSA, Murakami, T, Ugomori, T, Yoshida, K, Fujioka, S, Nishimura, H, Atarashi, H, Iyoda, T & Nagai, K 2017, 'High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas', Review of Scientific Instruments, vol. 88, no. 3, 033506. https://doi.org/10.1063/1.4978526
Musgrave, Christopher S.A. ; Murakami, Takehiro ; Ugomori, Teruyuki ; Yoshida, Kensuke ; Fujioka, Shinsuke ; Nishimura, Hiroaki ; Atarashi, Hironori ; Iyoda, Tomokazu ; Nagai, Keiji. / High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas. In: Review of Scientific Instruments. 2017 ; Vol. 88, No. 3.
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