High silicon self-diffusion coefficient in dry forsterite

Hongzhan Fei, Chamathni Hegoda, Daisuke Yamazaki, Michael Wiedenbeck, Hisayoshi Yurimoto, Svyatoslav Shcheka, Tomoo Katsura

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    56 Citations (Scopus)


    Silicon self-diffusion coefficients (D Si) in dry synthetic forsterite single crystals were measured at temperatures of 1600 and 1800K, from ambient pressure up to 13GPa using an ambient pressure furnace and Kawai-type multi-anvil apparatus. The water contents in the samples were carefully controlled at <1μg/g. Diffusion profiles were obtained by secondary ion mass spectrometry (SIMS) in depth profiling mode. Small negative pressure dependence of D Si is determined with an activation volume of 1.7±0.4cm 3/mol. The activation energy is found to be 410±30kJ/mol. LogD Si values (D Si in m 2/s) at 1600 and 1800K at ambient pressure are determined to be -19.7±0.4 and -18.1±0.3, respectively. These values are ~2.4 orders of magnitude higher than those reported by Jaoul et al. (1981). We speculate that their low D Si might reflect the effects of a horizontal migration of the isotopically enriched thin films applied on the sample surfaces, which may inhibit diffusion into the substrate during annealing. Our results for D Si resolve the inconsistency between D Si measured in diffusion experiments and those deduced from creep rates measured in deformation experiments.

    Original languageEnglish
    Pages (from-to)95-103
    Number of pages9
    JournalEarth and Planetary Science Letters
    Publication statusPublished - Sep 2012


    • Forsterite
    • Self-diffusion coefficient
    • Silicon

    ASJC Scopus subject areas

    • Geophysics
    • Geochemistry and Petrology
    • Earth and Planetary Sciences (miscellaneous)
    • Space and Planetary Science


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