Fundamental study on powder-scattering in positive- and negative-ion implantation into powder materials

Hiroshi Tsuji, Junzo Ishikawa, Hajime Itoh, Yoshitaka Toyota, Yasuhito Gotoh

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

The scattering of powder particles is caused by charging in the ion implantation of positive ions into dielectric powders without a charge compensation, this makes dose control difficult. We have studied the particle-scattering phenomenon in ion implantation into spherical powders both theoretically and experimentally. Taking into account Coulomb force, Van der Waals force and a gravity working on a sphere, the force balance equation was driven to give the threshold charging voltage above which the charged sphere begins to be scattered. In positive-argon-ion implantation into three oxide powders at an average size of 5, 115 and 425 μm, particle-scattering was observed above each ion-acceleration voltage (i.e., charging voltage) of 6.5, 1.0 and 2.7 kV, respectively. These voltages were in good agreement with the predicted threshold charging voltages. Conversely, in the negative-carbon-ion implantation, on the contrary, there was no scattering for all samples even at an ion acceleration voltage of 20 kV. The negative-ion implantation technique was found to be a non-scattering implantation method for powders.

Original languageEnglish
Pages (from-to)342-346
Number of pages5
JournalApplied Surface Science
Volume100-101
DOIs
Publication statusPublished - Jul 1996
Externally publishedYes

Fingerprint

positive ions
Ion implantation
negative ions
Powders
ion implantation
Negative ions
Positive ions
Scattering
charging
Electric potential
electric potential
scattering
Ions
Van der Waals forces
thresholds
Argon
Oxides
implantation
Gravitation
ions

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Condensed Matter Physics

Cite this

Fundamental study on powder-scattering in positive- and negative-ion implantation into powder materials. / Tsuji, Hiroshi; Ishikawa, Junzo; Itoh, Hajime; Toyota, Yoshitaka; Gotoh, Yasuhito.

In: Applied Surface Science, Vol. 100-101, 07.1996, p. 342-346.

Research output: Contribution to journalArticle

Tsuji, Hiroshi ; Ishikawa, Junzo ; Itoh, Hajime ; Toyota, Yoshitaka ; Gotoh, Yasuhito. / Fundamental study on powder-scattering in positive- and negative-ion implantation into powder materials. In: Applied Surface Science. 1996 ; Vol. 100-101. pp. 342-346.
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