Fundamental study on powder-scattering in positive- and negative-ion implantation into powder materials

Hiroshi Tsuji, Junzo Ishikawa, Hajime Itoh, Yoshitaka Toyota, Yasuhito Gotoh

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

The scattering of powder particles is caused by charging in the ion implantation of positive ions into dielectric powders without a charge compensation, this makes dose control difficult. We have studied the particle-scattering phenomenon in ion implantation into spherical powders both theoretically and experimentally. Taking into account Coulomb force, Van der Waals force and a gravity working on a sphere, the force balance equation was driven to give the threshold charging voltage above which the charged sphere begins to be scattered. In positive-argon-ion implantation into three oxide powders at an average size of 5, 115 and 425 μm, particle-scattering was observed above each ion-acceleration voltage (i.e., charging voltage) of 6.5, 1.0 and 2.7 kV, respectively. These voltages were in good agreement with the predicted threshold charging voltages. Conversely, in the negative-carbon-ion implantation, on the contrary, there was no scattering for all samples even at an ion acceleration voltage of 20 kV. The negative-ion implantation technique was found to be a non-scattering implantation method for powders.

Original languageEnglish
Pages (from-to)342-346
Number of pages5
JournalApplied Surface Science
Volume100-101
DOIs
Publication statusPublished - Jul 1996
Externally publishedYes

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Fundamental study on powder-scattering in positive- and negative-ion implantation into powder materials'. Together they form a unique fingerprint.

Cite this