Formation of SiH4 and H2O by the dissolution of quartz in H2 fluid under high pressure and temperature

Ayako Shinozaki, Hiroyuki Kagi, Naoki Noguchi, Hisako Hirai, Hiroaki Ohfuji, Taku Okada, Satoshi Nakano, Takehiko Yagi

    Research output: Contribution to journalArticlepeer-review

    8 Citations (Scopus)

    Abstract

    Species dissolved in H2 fluid were investigated in a SiO2-H2 system. Raman and infrared (IR) spectra were measured at high pressure and room temperature after heating experiments were conducted at two pressure and temperature conditions: 2.0 GPa, 1700 K and 3.0 GPa, 1500 K. With the dissolution of quartz, a SiH vibration mode assignable to SiH4 was detected from Raman spectra of the fluid phase. Furthermore, an OH vibration mode was observed at 3260 cm-1 from the IR spectra at 3.0 GPa. With decreasing pressure, the OH vibration frequencies observed between 3.0 and 2.1 GPa correspond to that of ice VII, and those observed at 1.4 and 1.1 GPa correspond to that of ice VI. These results indicate that the chemical reaction between dissolved SiO2 components and H2 fluid caused the formation of H2O and SiH4, which was contrastive to that observed in SiO2-H2O fluid. Results imply that a part of H2 is oxidized to form H2O when SiO2 components of mantle minerals dissolve in H2 fluid, even in an iron-free system.

    Original languageEnglish
    Pages (from-to)1265-1269
    Number of pages5
    JournalAmerican Mineralogist
    Volume99
    Issue number7
    DOIs
    Publication statusPublished - Jul 1 2014

    Keywords

    • Dissolution
    • H-HO fluid
    • IR
    • Laser-heated diamond-anvil cell
    • Raman

    ASJC Scopus subject areas

    • Geophysics
    • Geochemistry and Petrology

    Fingerprint

    Dive into the research topics of 'Formation of SiH<sub>4</sub> and H<sub>2</sub>O by the dissolution of quartz in H<sub>2</sub> fluid under high pressure and temperature'. Together they form a unique fingerprint.

    Cite this