Flexible nanofabrication in three-dimensional electron-beam lithography enhanced by suppression of proximity effect

Kenji Yamazaki, Hiroshi Yamaguchi

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

Nanofabrication of three-dimensional (3D) structures with a high aspect ratio has been achieved using electron-beam (EB) lithography. Although electron scattering, or the proximity effect, on the remaining parts in positive resist is generally serious for repeated EB writing from different 3D directions, we can largely avoid the effect by adding appropriate surrounding buffer regions, which are cut off by the following EB writing and development. This enables us to make a 3D nanostructure in poly(methyl methacrylate) (PMMA), which demonstrates the great structural flexibility obtainable in our EB technique.

Original languageEnglish
Pages (from-to)970011-970013
Number of pages3
JournalApplied Physics Express
Volume1
Issue number9
DOIs
Publication statusPublished - Sep 1 2008

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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