Abstract
In our previous studies, a thin alumina film formation was possible by a large-area EB irradiation using a alumina target tube. However, film formation mechanism has not yet been clarified. In this study, the influences of magnetic property and electrical conductivity of a jig supporting an alumina target tube on the film formation were investigated. The spectrum of plasma generated on the substrate surface was measured during the EB irradiation. The results indicated that the film was formed by sputtering target material with the plasma of workpiece material caused by EB irradiation, and the magnetic property of the jig greatly influences on the film formation.
| Original language | English |
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| Title of host publication | Proceedings of the 8th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2015 |
| Publisher | Japan Society of Mechanical Engineers |
| Publication status | Published - Oct 18 2015 |
| Event | 8th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2015 - Kyoto, Japan Duration: Oct 18 2015 → Oct 22 2015 |
Other
| Other | 8th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2015 |
|---|---|
| Country/Territory | Japan |
| City | Kyoto |
| Period | 10/18/15 → 10/22/15 |
Keywords
- Alumina
- Film formation mechanism
- Large-area electron beam
- Plasma spectroscopy
- Sputter deposition
ASJC Scopus subject areas
- Industrial and Manufacturing Engineering