Evaluation of surface damage of organic films due to irradiation with energetic ion beams

Masaki Hada; Yusaku Hontani; Sachi Ibuki; Kazuya Ichiki; Satoshi Ninomiya; Toshio Seki; Takaaki Aoki; Jiro Matsuo

doi:10.1063/1.3548390

Evaluation of surface damage of organic films due to irradiation with energetic ion beams

Masaki Hada, Yusaku Hontani, Sachi Ibuki, Kazuya Ichiki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo

Graduate School of Natural Science and Technology

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Citation (Scopus)

Abstract

The surface of L-leucine films irradiated with an Ar₅₀₀₀ cluster ion beam (5 keV) was characterized by using the X-ray reflective (XRR) measurement method, atomic force microscopy (AFM) and ellipsometry. No significant damage was detected on the surface of the L-leucine films irradiated with the Ar cluster ion beam. Therefore, the large cluster-low-energy (about 1 eV/atom) beam would be suitable for low-damage etching of organic materials.

Original language	English
Title of host publication	Ion Implantation Technology 2010 - 18th International Conference on Ion Implantation Technology, IIT 2010
Pages	314-316
Number of pages	3
DOIs	https://doi.org/10.1063/1.3548390
Publication status	Published - Dec 1 2010
Event	18th International Conference on Ion Implantation Technology, IIT 2010 - Kyoto, Japan Duration: Jun 6 2010 → Jun 11 2010

Publication series

Name	AIP Conference Proceedings
Volume	1321
ISSN (Print)	0094-243X
ISSN (Electronic)	1551-7616

Other

Other	18th International Conference on Ion Implantation Technology, IIT 2010
Country	Japan
City	Kyoto
Period	6/6/10 → 6/11/10

Keywords

Ar cluster
damage evaluation
organic material
surface roughness

ASJC Scopus subject areas

Physics and Astronomy(all)

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Hada, M., Hontani, Y., Ibuki, S., Ichiki, K., Ninomiya, S., Seki, T., Aoki, T., & Matsuo, J. (2010). Evaluation of surface damage of organic films due to irradiation with energetic ion beams. In Ion Implantation Technology 2010 - 18th International Conference on Ion Implantation Technology, IIT 2010 (pp. 314-316). (AIP Conference Proceedings; Vol. 1321). https://doi.org/10.1063/1.3548390

Evaluation of surface damage of organic films due to irradiation with energetic ion beams. / Hada, Masaki; Hontani, Yusaku; Ibuki, Sachi; Ichiki, Kazuya; Ninomiya, Satoshi; Seki, Toshio; Aoki, Takaaki; Matsuo, Jiro.

Ion Implantation Technology 2010 - 18th International Conference on Ion Implantation Technology, IIT 2010. 2010. p. 314-316 (AIP Conference Proceedings; Vol. 1321).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Hada, M, Hontani, Y, Ibuki, S, Ichiki, K, Ninomiya, S, Seki, T, Aoki, T & Matsuo, J 2010, Evaluation of surface damage of organic films due to irradiation with energetic ion beams. in Ion Implantation Technology 2010 - 18th International Conference on Ion Implantation Technology, IIT 2010. AIP Conference Proceedings, vol. 1321, pp. 314-316, 18th International Conference on Ion Implantation Technology, IIT 2010, Kyoto, Japan, 6/6/10. https://doi.org/10.1063/1.3548390

Hada, Masaki ; Hontani, Yusaku ; Ibuki, Sachi ; Ichiki, Kazuya ; Ninomiya, Satoshi ; Seki, Toshio ; Aoki, Takaaki ; Matsuo, Jiro. / Evaluation of surface damage of organic films due to irradiation with energetic ion beams. Ion Implantation Technology 2010 - 18th International Conference on Ion Implantation Technology, IIT 2010. 2010. pp. 314-316 (AIP Conference Proceedings).

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abstract = "The surface of L-leucine films irradiated with an Ar5000 cluster ion beam (5 keV) was characterized by using the X-ray reflective (XRR) measurement method, atomic force microscopy (AFM) and ellipsometry. No significant damage was detected on the surface of the L-leucine films irradiated with the Ar cluster ion beam. Therefore, the large cluster-low-energy (about 1 eV/atom) beam would be suitable for low-damage etching of organic materials.",

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AU - Ninomiya, Satoshi

AU - Seki, Toshio

AU - Aoki, Takaaki

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AB - The surface of L-leucine films irradiated with an Ar5000 cluster ion beam (5 keV) was characterized by using the X-ray reflective (XRR) measurement method, atomic force microscopy (AFM) and ellipsometry. No significant damage was detected on the surface of the L-leucine films irradiated with the Ar cluster ion beam. Therefore, the large cluster-low-energy (about 1 eV/atom) beam would be suitable for low-damage etching of organic materials.

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KW - organic material

KW - surface roughness

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Evaluation of surface damage of organic films due to irradiation with energetic ion beams

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