Evaluation of surface damage of organic films due to irradiation with energetic ion beams

Masaki Hada, Yusaku Hontani, Sachi Ibuki, Kazuya Ichiki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

The surface of L-leucine films irradiated with an Ar5000 cluster ion beam (5 keV) was characterized by using the X-ray reflective (XRR) measurement method, atomic force microscopy (AFM) and ellipsometry. No significant damage was detected on the surface of the L-leucine films irradiated with the Ar cluster ion beam. Therefore, the large cluster-low-energy (about 1 eV/atom) beam would be suitable for low-damage etching of organic materials.

Original languageEnglish
Title of host publicationIon Implantation Technology 2010 - 18th International Conference on Ion Implantation Technology, IIT 2010
Pages314-316
Number of pages3
DOIs
Publication statusPublished - Dec 1 2010
Event18th International Conference on Ion Implantation Technology, IIT 2010 - Kyoto, Japan
Duration: Jun 6 2010Jun 11 2010

Publication series

NameAIP Conference Proceedings
Volume1321
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Other

Other18th International Conference on Ion Implantation Technology, IIT 2010
CountryJapan
CityKyoto
Period6/6/106/11/10

Keywords

  • Ar cluster
  • damage evaluation
  • organic material
  • surface roughness

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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  • Cite this

    Hada, M., Hontani, Y., Ibuki, S., Ichiki, K., Ninomiya, S., Seki, T., Aoki, T., & Matsuo, J. (2010). Evaluation of surface damage of organic films due to irradiation with energetic ion beams. In Ion Implantation Technology 2010 - 18th International Conference on Ion Implantation Technology, IIT 2010 (pp. 314-316). (AIP Conference Proceedings; Vol. 1321). https://doi.org/10.1063/1.3548390