Evaluation of damage layer in an organic film with irradiation of energetic ion beams

Masaki Hada; Sachi Ibuki; Satoshi Ninomiya; Toshio Seki; Takaaki Aoki; Jiro Matsuo

doi:10.1143/JJAP.49.036503

Evaluation of damage layer in an organic film with irradiation of energetic ion beams

Masaki Hada, Sachi Ibuki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo

Graduate School of Natural Science and Technology

Research output: Contribution to journal › Article › peer-review

15 Citations (Scopus)

Abstract

We characterized the thickness and surface damage layer of poly(methyl metacrylate) (PMMA) organic films irradiated with Ar cluster or monomer ion beam using ellipsometry. A heavily damaged layer was detected on the surface of the PMMA film irradiated with Ar monomer ion beam; more than 2-3 nm of the surface were completely metamorphosed into a carbon-like layer and damage had accumulated with irradiation. On the other hand, no significant damage was detected on PMMA films irradiated with Ar cluster ion beams. These results corresponded with measurements of the irradiated surface by X-ray photoelectron spectroscopy (XPS). The sputtering depth from PMMA film irradiated with Ar cluster/monomer ion beams can also be measured using the ellipsometry method at nanometer-order resolution. The optical method of ellipsometry may be a desirable tool for sputtering yield measurement and surface damage layer estimation for organic films.

Original language	English
Journal	Japanese journal of applied physics
Volume	49
Issue number	3 PART 1
DOIs	https://doi.org/10.1143/JJAP.49.036503
Publication status	Published - Jul 1 2010

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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abstract = "We characterized the thickness and surface damage layer of poly(methyl metacrylate) (PMMA) organic films irradiated with Ar cluster or monomer ion beam using ellipsometry. A heavily damaged layer was detected on the surface of the PMMA film irradiated with Ar monomer ion beam; more than 2-3 nm of the surface were completely metamorphosed into a carbon-like layer and damage had accumulated with irradiation. On the other hand, no significant damage was detected on PMMA films irradiated with Ar cluster ion beams. These results corresponded with measurements of the irradiated surface by X-ray photoelectron spectroscopy (XPS). The sputtering depth from PMMA film irradiated with Ar cluster/monomer ion beams can also be measured using the ellipsometry method at nanometer-order resolution. The optical method of ellipsometry may be a desirable tool for sputtering yield measurement and surface damage layer estimation for organic films.",

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T1 - Evaluation of damage layer in an organic film with irradiation of energetic ion beams

AU - Hada, Masaki

AU - Ibuki, Sachi

AU - Ninomiya, Satoshi

AU - Seki, Toshio

AU - Aoki, Takaaki

AU - Matsuo, Jiro

PY - 2010/7/1

Y1 - 2010/7/1

N2 - We characterized the thickness and surface damage layer of poly(methyl metacrylate) (PMMA) organic films irradiated with Ar cluster or monomer ion beam using ellipsometry. A heavily damaged layer was detected on the surface of the PMMA film irradiated with Ar monomer ion beam; more than 2-3 nm of the surface were completely metamorphosed into a carbon-like layer and damage had accumulated with irradiation. On the other hand, no significant damage was detected on PMMA films irradiated with Ar cluster ion beams. These results corresponded with measurements of the irradiated surface by X-ray photoelectron spectroscopy (XPS). The sputtering depth from PMMA film irradiated with Ar cluster/monomer ion beams can also be measured using the ellipsometry method at nanometer-order resolution. The optical method of ellipsometry may be a desirable tool for sputtering yield measurement and surface damage layer estimation for organic films.

AB - We characterized the thickness and surface damage layer of poly(methyl metacrylate) (PMMA) organic films irradiated with Ar cluster or monomer ion beam using ellipsometry. A heavily damaged layer was detected on the surface of the PMMA film irradiated with Ar monomer ion beam; more than 2-3 nm of the surface were completely metamorphosed into a carbon-like layer and damage had accumulated with irradiation. On the other hand, no significant damage was detected on PMMA films irradiated with Ar cluster ion beams. These results corresponded with measurements of the irradiated surface by X-ray photoelectron spectroscopy (XPS). The sputtering depth from PMMA film irradiated with Ar cluster/monomer ion beams can also be measured using the ellipsometry method at nanometer-order resolution. The optical method of ellipsometry may be a desirable tool for sputtering yield measurement and surface damage layer estimation for organic films.

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Evaluation of damage layer in an organic film with irradiation of energetic ion beams

Abstract

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