EUV Source Design Flexibility for Lithography

Research output: Contribution to journalArticle

2 Citations (Scopus)
Original languageEnglish
Pages (from-to)42065-42065
Number of pages1
JournalJournal of Physics: Conference Series
Volume112
Publication statusPublished - 2008

Cite this

EUV Source Design Flexibility for Lithography. / Nishikawa, Takeshi.

In: Journal of Physics: Conference Series, Vol. 112, 2008, p. 42065-42065.

Research output: Contribution to journalArticle

@article{6cd70ca10c0e4a6cb62cf2bb6299aa56,
title = "EUV Source Design Flexibility for Lithography",
author = "Takeshi Nishikawa",
year = "2008",
language = "English",
volume = "112",
pages = "42065--42065",
journal = "Journal of Physics: Conference Series",

}

TY - JOUR

T1 - EUV Source Design Flexibility for Lithography

AU - Nishikawa, Takeshi

PY - 2008

Y1 - 2008

M3 - Article

VL - 112

SP - 42065

EP - 42065

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

ER -