Estimation of emission efficiency for laser-produced EUV-plasmas

Tohru Kawamura, Atsushi Sunahara, Kouhei Gamada, Kazumi Fujima, Fumihiro Koike, Hiroyuki Furukawa, Takeshi Nishikawa, Akira Sasaki, Takashi Kagawa, Richard More, Takako Kato, Masakatsu Murakami, Vasilli Zhakhovskii, Hajime Tanuma, Takashi Fujimoto, Yoshinori Shimada, Michiteru Yamaura, Kazuhisa Hashimoto, Shigeaki Uchida, Chiyoe YamanakaTomoharu Okuno, Takahiro Hibino, Nobuyoshi Ueda, Ryoji Matsui, Yezheng Tao, Mitsuo Nakai, Keisuke Shigemori, Shinsuke Fujioka, Keiji Nagai, Takayoshi Norimatsu, Hiroaki Nishimura, Katsunobu Nishihara, Noriaki Miyanaga, Yasukazu Izawa

Research output: Contribution to journalConference article

6 Citations (Scopus)

Abstract

Extreme Ultra Violet (EUV) light source produced by laser irradiation emits not only the desired EUV light of 13 ∼ 14 nm (about 90 eV) but also shorter x-rays. For example, emissions around 4 ∼ 8 nm (about 150 ∼ 300 eV) and 1 ∼ 2.5 nm (about 0.5 ∼ 1.2keV) are experimentally observed from Sn and/or SnO2 plasmas. These emissions are correspond to the N-shell and M-shell transitions, respectively. From the view point of energy balance and efficiency, these transitions should be suppressed. However, they may, to some extent, contribute to provide the 5p and 4f levels with electrons which eventually emit the EUV light and enhance the intensity. To know well about radiative properties and kinematic of the whole plasma, atomic population kinetics and spectral synthesis codes have been developed. These codes can estimate the atomic population with nl-scheme and spectral shapes of the EUV light. Radiation hydrodynamic simulation have been proceeding in this analysis. Finally, the laser intensity dependence of the conversion efficiency calculated by these codes agrees with that of the corresponding experimental results.

Original languageEnglish
Pages (from-to)918-925
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5374
Issue numberPART 2
DOIs
Publication statusPublished - Aug 18 2004
EventEmerging Lithographic Technologies VIII - Santa Clara, CA, United States
Duration: Feb 24 2004Feb 26 2004

Keywords

  • Code development
  • Conversion efficiency
  • EUV
  • Laser-produced tin-plasmas

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Kawamura, T., Sunahara, A., Gamada, K., Fujima, K., Koike, F., Furukawa, H., Nishikawa, T., Sasaki, A., Kagawa, T., More, R., Kato, T., Murakami, M., Zhakhovskii, V., Tanuma, H., Fujimoto, T., Shimada, Y., Yamaura, M., Hashimoto, K., Uchida, S., ... Izawa, Y. (2004). Estimation of emission efficiency for laser-produced EUV-plasmas. Proceedings of SPIE - The International Society for Optical Engineering, 5374(PART 2), 918-925. https://doi.org/10.1117/12.535031