Electron-beam diameter measurement using a knife edge with a visor for scattering electrons

Kenji Yamazaki; Hideo Namatsu

Electron-beam diameter measurement using a knife edge with a visor for scattering electrons

Kenji Yamazaki, Hideo Namatsu

Faculty of Engineering

Research output: Contribution to journal › Letter › peer-review

8 Citations (Scopus)

Abstract

A novel knife edge (KE) for measurement of the electron beam (EB) diameter was made and evaluated. To screen off electrons scattered at the edge, the Si KE has a 'visor' made of Ta, which is formed in a body and aligned with the KE. Monte Carlo simulation revealed that the scattering electrons are not negligible to accurately measure the beam diameter using a KE, and that the visor effectively screens them out, especially at smaller diameters of a few nanometers. An EB diameter of less than 5 nm in a lithography system was accurately measured using the KE, which is consistent with the lithography results.

Original language	English
Pages (from-to)	L491-L493
Journal	Japanese Journal of Applied Physics, Part 2: Letters
Volume	42
Issue number	5 A
Publication status	Published - May 1 2003

Keywords

Beam diameter
Electron beam nanolithography
Knife edge
Monte Carlo simulation
Scattering electron

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy (miscellaneous)
Physics and Astronomy(all)

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abstract = "A novel knife edge (KE) for measurement of the electron beam (EB) diameter was made and evaluated. To screen off electrons scattered at the edge, the Si KE has a 'visor' made of Ta, which is formed in a body and aligned with the KE. Monte Carlo simulation revealed that the scattering electrons are not negligible to accurately measure the beam diameter using a KE, and that the visor effectively screens them out, especially at smaller diameters of a few nanometers. An EB diameter of less than 5 nm in a lithography system was accurately measured using the KE, which is consistent with the lithography results.",

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author = "Kenji Yamazaki and Hideo Namatsu",

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journal = "Japanese Journal of Applied Physics, Part 2: Letters",

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T1 - Electron-beam diameter measurement using a knife edge with a visor for scattering electrons

AU - Yamazaki, Kenji

AU - Namatsu, Hideo

PY - 2003/5/1

Y1 - 2003/5/1

N2 - A novel knife edge (KE) for measurement of the electron beam (EB) diameter was made and evaluated. To screen off electrons scattered at the edge, the Si KE has a 'visor' made of Ta, which is formed in a body and aligned with the KE. Monte Carlo simulation revealed that the scattering electrons are not negligible to accurately measure the beam diameter using a KE, and that the visor effectively screens them out, especially at smaller diameters of a few nanometers. An EB diameter of less than 5 nm in a lithography system was accurately measured using the KE, which is consistent with the lithography results.

AB - A novel knife edge (KE) for measurement of the electron beam (EB) diameter was made and evaluated. To screen off electrons scattered at the edge, the Si KE has a 'visor' made of Ta, which is formed in a body and aligned with the KE. Monte Carlo simulation revealed that the scattering electrons are not negligible to accurately measure the beam diameter using a KE, and that the visor effectively screens them out, especially at smaller diameters of a few nanometers. An EB diameter of less than 5 nm in a lithography system was accurately measured using the KE, which is consistent with the lithography results.

KW - Beam diameter

KW - Electron beam nanolithography

KW - Knife edge

KW - Monte Carlo simulation

KW - Scattering electron

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VL - 42

SP - L491-L493

JO - Japanese Journal of Applied Physics, Part 2: Letters

JF - Japanese Journal of Applied Physics, Part 2: Letters

SN - 0021-4922

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