Abstract
A novel knife edge (KE) for measurement of the electron beam (EB) diameter was made and evaluated. To screen off electrons scattered at the edge, the Si KE has a 'visor' made of Ta, which is formed in a body and aligned with the KE. Monte Carlo simulation revealed that the scattering electrons are not negligible to accurately measure the beam diameter using a KE, and that the visor effectively screens them out, especially at smaller diameters of a few nanometers. An EB diameter of less than 5 nm in a lithography system was accurately measured using the KE, which is consistent with the lithography results.
| Original language | English |
|---|---|
| Pages (from-to) | L491-L493 |
| Journal | Japanese Journal of Applied Physics, Part 2: Letters |
| Volume | 42 |
| Issue number | 5 A |
| Publication status | Published - May 1 2003 |
Keywords
- Beam diameter
- Electron beam nanolithography
- Knife edge
- Monte Carlo simulation
- Scattering electron
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy (miscellaneous)
- Physics and Astronomy(all)