Electron-beam diameter measurement using a knife edge with a visor for scattering electrons

Kenji Yamazaki, Hideo Namatsu

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

A novel knife edge (KE) for measurement of the electron beam (EB) diameter was made and evaluated. To screen off electrons scattered at the edge, the Si KE has a 'visor' made of Ta, which is formed in a body and aligned with the KE. Monte Carlo simulation revealed that the scattering electrons are not negligible to accurately measure the beam diameter using a KE, and that the visor effectively screens them out, especially at smaller diameters of a few nanometers. An EB diameter of less than 5 nm in a lithography system was accurately measured using the KE, which is consistent with the lithography results.

Original languageEnglish
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume42
Issue number5 A
Publication statusPublished - May 1 2003
Externally publishedYes

Fingerprint

visors
Electron scattering
Lithography
Electron beams
electron scattering
electron beams
Electrons
lithography

Keywords

  • Beam diameter
  • Electron beam nanolithography
  • Knife edge
  • Monte Carlo simulation
  • Scattering electron

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Electron-beam diameter measurement using a knife edge with a visor for scattering electrons. / Yamazaki, Kenji; Namatsu, Hideo.

In: Japanese Journal of Applied Physics, Part 2: Letters, Vol. 42, No. 5 A, 01.05.2003.

Research output: Contribution to journalArticle

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