Abstract
A novel knife edge (KE) for measurement of the electron beam (EB) diameter was made and evaluated. To screen off electrons scattered at the edge, the Si KE has a 'visor' made of Ta, which is formed in a body and aligned with the KE. Monte Carlo simulation revealed that the scattering electrons are not negligible to accurately measure the beam diameter using a KE, and that the visor effectively screens them out, especially at smaller diameters of a few nanometers. An EB diameter of less than 5 nm in a lithography system was accurately measured using the KE, which is consistent with the lithography results.
| Original language | English |
|---|---|
| Journal | Japanese Journal of Applied Physics, Part 2: Letters |
| Volume | 42 |
| Issue number | 5 A |
| Publication status | Published - May 1 2003 |
| Externally published | Yes |
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Keywords
- Beam diameter
- Electron beam nanolithography
- Knife edge
- Monte Carlo simulation
- Scattering electron
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
Cite this
Electron-beam diameter measurement using a knife edge with a visor for scattering electrons. / Yamazaki, Kenji; Namatsu, Hideo.
In: Japanese Journal of Applied Physics, Part 2: Letters, Vol. 42, No. 5 A, 01.05.2003.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Electron-beam diameter measurement using a knife edge with a visor for scattering electrons
AU - Yamazaki, Kenji
AU - Namatsu, Hideo
PY - 2003/5/1
Y1 - 2003/5/1
N2 - A novel knife edge (KE) for measurement of the electron beam (EB) diameter was made and evaluated. To screen off electrons scattered at the edge, the Si KE has a 'visor' made of Ta, which is formed in a body and aligned with the KE. Monte Carlo simulation revealed that the scattering electrons are not negligible to accurately measure the beam diameter using a KE, and that the visor effectively screens them out, especially at smaller diameters of a few nanometers. An EB diameter of less than 5 nm in a lithography system was accurately measured using the KE, which is consistent with the lithography results.
AB - A novel knife edge (KE) for measurement of the electron beam (EB) diameter was made and evaluated. To screen off electrons scattered at the edge, the Si KE has a 'visor' made of Ta, which is formed in a body and aligned with the KE. Monte Carlo simulation revealed that the scattering electrons are not negligible to accurately measure the beam diameter using a KE, and that the visor effectively screens them out, especially at smaller diameters of a few nanometers. An EB diameter of less than 5 nm in a lithography system was accurately measured using the KE, which is consistent with the lithography results.
KW - Beam diameter
KW - Electron beam nanolithography
KW - Knife edge
KW - Monte Carlo simulation
KW - Scattering electron
UR - http://www.scopus.com/inward/record.url?scp=0037670861&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0037670861&partnerID=8YFLogxK
M3 - Article
AN - SCOPUS:0037670861
VL - 42
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 5 A
ER -