Efficient photocarrier injection to transition metal oxides

Yuji Muraoka, T. Yamauchi, T. Muramatsu, J. Yamaura, Z. Hiroi

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

We have fabricated transition metal oxide (TMO) films on n-type titanium oxide substrates, and measured in-plane resistance under ultraviolet light irradiation. A dramatic decrease in the resistance and enhancement of the superconducting critical temperature are observed for VO2/TiO 2:Nb and YBa2Cu3Oz/SrTiO 3:Nb, respectively. Out-of-plane voltage measurements under light irradiation indicate hole-carrier injection from the substrate to the film in both the cases. The present photocarrier injection technique could apply to many TMOs to control the hole carrier density externally.

Original languageEnglish
Pages (from-to)448-449
Number of pages2
JournalJournal of Magnetism and Magnetic Materials
Volume272-276
Issue numberI
DOIs
Publication statusPublished - May 2004
Externally publishedYes

Fingerprint

Oxides
Transition metals
metal oxides
transition metals
Irradiation
injection
irradiation
carrier injection
Titanium oxides
Voltage measurement
Substrates
titanium oxides
ultraviolet radiation
electrical measurement
Oxide films
Carrier concentration
oxide films
critical temperature
augmentation
Temperature

Keywords

  • Heterostructurc
  • Photocarrier injection
  • Transition metal oxides
  • VO
  • YBaCuO

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

Efficient photocarrier injection to transition metal oxides. / Muraoka, Yuji; Yamauchi, T.; Muramatsu, T.; Yamaura, J.; Hiroi, Z.

In: Journal of Magnetism and Magnetic Materials, Vol. 272-276, No. I, 05.2004, p. 448-449.

Research output: Contribution to journalArticle

Muraoka, Yuji ; Yamauchi, T. ; Muramatsu, T. ; Yamaura, J. ; Hiroi, Z. / Efficient photocarrier injection to transition metal oxides. In: Journal of Magnetism and Magnetic Materials. 2004 ; Vol. 272-276, No. I. pp. 448-449.
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