Efficient nitrogen incorporation into amorphous carbon films by double beam method

Yasuhiko Hayashi, T. Kamio, T. Soga, K. Kaneko, T. Jimbo

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

Conductivity of amorphous carbon (a-C) was successfully controlled by incorporation of nitrogen atoms using a double beam method (DBM), where both rf nitrogen radical and rf methane plasma sources were controlled separately to optimize the nitrogen incorporation. The as-grown a-C is p-type with a conductivity of 10-11 Ωcm and activation energy (Ea) of 333 meV. The addition of nitrogen atoms under varying nitrogen flow rate from 0 to 2.0 sccm caused the conductivity to reach 10-4 Ωcm as maximum and Ea of 41 meV at 1.5 sccm. The optical band gap is shown to vary only marginally from standard of the as-grown of a-C film (1.39 eV) to 1.45 eV by nitrogen incorporation. The depth profile of a secondary ion mass spectroscopy (SIMS) shows that the uniform concentration of C and N in the films and the sharp interface between nitrogen doped and undoped regions from the doped/undoped sandwich-like a-C structure. Furthermore, the changes in the chemical structure and relative bond fractions as a function of nitrogen flow rate are reported based on the results of an X-ray photoelectron spectroscopy and a Raman spectroscopy.

Original languageEnglish
Pages (from-to)970-974
Number of pages5
JournalDiamond and Related Materials
Volume14
Issue number3-7
DOIs
Publication statusPublished - Mar 1 2005
Externally publishedYes

Keywords

  • Amorphous carbon films
  • Conductivity
  • Double beam method
  • Nitrogen incorporation

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

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