Effects of vacuum ultraviolet light illumination and seeding on crystallization of sol-gel-derived titanium dioxide precursor films using plasma treatment

Naoki Arimitsu, Akira Nakajima, Yoshikazu Kameshima, Yuko Shibayama, Hisashi Ohsaki, Kiyoshi Okada

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

The current study investigated the effects of vacuum ultraviolet (VUV) illumination and seeding on the crystallization of sol-gel-derived titanium dioxide (TiO2) precursor films on Si(100) and Pyrex glass substrates by plasma treatment. To improve the film microstructure to one that is amenable to crystallization, VUV illumination is found to be effective. However, crystallization behavior suggests that a proper balance between decomposition of organic compounds and densification by dehydration is important for the treatment. The combination of seeding and VUV illumination is effective even for crystallization by plasma treatment on both Si(100) and Pyrex glass substrates.

Original languageEnglish
Pages (from-to)3038-3043
Number of pages6
JournalSurface and Coatings Technology
Volume201
Issue number6
DOIs
Publication statusPublished - Dec 4 2006
Externally publishedYes

Keywords

  • Crystallization
  • Plasma
  • Seeding
  • Titanium oxide
  • Vacuum ultraviolet

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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