Effectiveness of a hot-filament chemical vapor deposition method for preparation of a boron-doped superconducting diamond film with higher superconducting transition temperature

T. Doi, T. Fukaishi, C. Hiramatsu, Takanori Wakita, M. Hirai, Yuji Muraoka, Takayoshi Yokoya, Y. Kato, Y. Izumi, T. Muro, Y. Tamenori

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Abstract

We have investigated the effectiveness of a hot-filament chemical vapor deposition (HFCVD) method for preparation of a boron-doped superconducting diamond film with higher superconducting transition temperature (T c). A boron-doped superconducting diamond film has been fabricated on a diamond (111) substrate using the HFCVD method, and studied by means of scanning electron microscopy, X-ray photoelectron spectroscopy (XPS), and resistivity. The film consists of grains with an average size of 200 mm. Analyses of valence band and boron 1s core-level XPS spectra indicate the formation of boron-doped diamond film on the substrate. From the resistivity measurements, the film is found to be a superconductor with onset T c of 7.1 K. Carrier concentration determined by Hall conductivity measurements is 1.1 × 10 21 cm - 3. The value of T c is higher compared with that in boron-doped superconducting diamond films prepared by a commonly used microwave plasma-assisted chemical vapor deposition (MPCVD) method, at the same carrier concentration [A. Kawano et al., Phys. Rev. B 82 (2010) 085318]. The result of higher T c in the film by the HFCVD method is consistent with the previous one [Wang et al., Diamond Relat. Mater. 15 (2006) 659], suggesting that the HFCVD method is effective for preparation of boron-doped superconducting diamond films showing higher T c.

Original languageEnglish
Pages (from-to)5-7
Number of pages3
JournalDiamond and Related Materials
Volume25
DOIs
Publication statusPublished - May 2012

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Keywords

  • Boron-doped diamond
  • Film
  • Hot-filament chemical vapor deposition
  • Superconductivity

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Electrical and Electronic Engineering
  • Mechanical Engineering
  • Physics and Astronomy(all)
  • Chemistry(all)

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