Effect of the satellite lines and opacity on the extreme ultraviolet emission from high-density Xe plasmas

Akira Sasaki, Katsunobu Nishihara, Masakatsu Murakami, Fumihiro Koike, Takashi Kagawa, Takashi Nishikawa, Kazumi Fujima, Tohru Kawamura, Hiroyuki Furukawa

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43 Citations (Scopus)

Abstract

Extreme ultraviolet (EUV) emission from Xe plasma in the λ=13.5 nm band is theoretically investigated for lithographic application. It appears that a large number of satellite lines due to the 4d-4f, 4d-5p, and 4p-4d transitions significantly contribute to the emission over the spectral range from 10 to 17 nm. At electron densities above 1020 cm3, laser-produced Xe plasmas attain quasilocal thermodynamic equilibrium (LTE) in order to make the emission intensity in the 13.5 nm band comparable to that in the 11 nm band.

Original languageEnglish
Pages (from-to)5857-5859
Number of pages3
JournalApplied Physics Letters
Volume85
Issue number24
DOIs
Publication statusPublished - Dec 13 2004

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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    Sasaki, A., Nishihara, K., Murakami, M., Koike, F., Kagawa, T., Nishikawa, T., Fujima, K., Kawamura, T., & Furukawa, H. (2004). Effect of the satellite lines and opacity on the extreme ultraviolet emission from high-density Xe plasmas. Applied Physics Letters, 85(24), 5857-5859. https://doi.org/10.1063/1.1834994