Effect of rf power on the photovoltaic properties of boron-doped amorphous carbon/n-type silicon junction fabricated by plasma enhanced chemical vapor deposition

Tetsuo Soga, Toshihide Kokubu, Yasuhiko Hayashi, Takashi Jimbo

Research output: Contribution to journalArticle

42 Citations (Scopus)

Abstract

The optical and electrical properties of boron doped amorphous carbon thin films using methane and trimethylboron by plasma enhanced chemical vapor deposition are studied with varying the rf power. The optical bandgap is decreased from 2.4 to 1.4 eV with increasing the rf power due to the increase of sp2 carbon. The boron doped amorphous carbon deposited at 300 W shows large photoconductivity (the ratio of conductivity under illumination to under dark) with high spin density. The open circuit voltage of boron doped amorphous carbon/n-Si structure photovoltaic cell is increased with the increase of rf power and then saturates over 100 W. On the other hand, the short circuit current is increased gradually with increasing the rf power up to 300 W.

Original languageEnglish
Pages (from-to)86-89
Number of pages4
JournalThin Solid Films
Volume482
Issue number1-2
DOIs
Publication statusPublished - Jun 22 2005
Externally publishedYes

Fingerprint

silicon junctions
Boron
Amorphous carbon
Silicon
Plasma enhanced chemical vapor deposition
boron
vapor deposition
carbon
Photovoltaic cells
Carbon films
Optical band gaps
Methane
Photoconductivity
Open circuit voltage
Short circuit currents
photovoltaic cells
Electric properties
Carbon
short circuit currents
Optical properties

Keywords

  • Amorphous carbon
  • Photovoltaic
  • Plasma enhanced CVD

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Effect of rf power on the photovoltaic properties of boron-doped amorphous carbon/n-type silicon junction fabricated by plasma enhanced chemical vapor deposition. / Soga, Tetsuo; Kokubu, Toshihide; Hayashi, Yasuhiko; Jimbo, Takashi.

In: Thin Solid Films, Vol. 482, No. 1-2, 22.06.2005, p. 86-89.

Research output: Contribution to journalArticle

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AB - The optical and electrical properties of boron doped amorphous carbon thin films using methane and trimethylboron by plasma enhanced chemical vapor deposition are studied with varying the rf power. The optical bandgap is decreased from 2.4 to 1.4 eV with increasing the rf power due to the increase of sp2 carbon. The boron doped amorphous carbon deposited at 300 W shows large photoconductivity (the ratio of conductivity under illumination to under dark) with high spin density. The open circuit voltage of boron doped amorphous carbon/n-Si structure photovoltaic cell is increased with the increase of rf power and then saturates over 100 W. On the other hand, the short circuit current is increased gradually with increasing the rf power up to 300 W.

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