Effect of radio frequency power on the properties of hydrogenated amorphous carbon films grown by radio frequency plasma-enhanced chemical vapor deposition

Yasuhiko Hayashi, Kouji Hagimoto, Hiroshi Ebisu, Murali Krishna Kalaga, Tetsuo Soga, Masayoshi Umeno, Takashi Jimbo

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

We have studied the influence of radio frequency (RF) power on material properties of hydrogenated amorphous carbon (a-C:H) films prepared by RF plasma-enhanced chemical vapor deposition (CVD). The RF power has a significant impact on film properties such as electron spin resonance (ESR) spin density, the optical band gap, chemical bonding and photoluminescence (PL). Raman spectroscopy, infrared (IR) absorption and ESR measurements reveal that the residual defect density (ESR spin density) increases with increasing RF power due to the increase of sp2 C-Hx components. We obtained an ESR spin density as small as 8 × 1016 spins/cm3 at a low RF power, which is comparable to that of high-quality amorphous silicon films. Plasma optical emission spectroscopy indicates that the intensity ratio (IC-H/IH) between hydrogen peaks (IH) and hydrocarbon peaks (IC-H) significantly decreases with increasing RF power. The optical band gap, obtained from UV-visible spectroscopy, varies from 3.0 to 1.9eV with increasing RF power. The broad emission band centered around 2.4 eV was observed in the PL spectra of the samples deposited at lower RF powers. We found a 0.5-0.3 eV Stokes shift by comparing the PL emission and the absorption coefficient spectrum from the films deposited at ≤100W RF powers, whereas, we failed to observe a clear Stokes shift from the films deposited at >100W RF powers. A weak correlation between the PL peak and the optical band gap is demonstrated.

Original languageEnglish
Pages (from-to)4088-4093
Number of pages6
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume39
Issue number7 A
Publication statusPublished - 2000
Externally publishedYes

Fingerprint

Carbon films
Amorphous carbon
Amorphous films
Plasma enhanced chemical vapor deposition
radio frequencies
vapor deposition
carbon
Paramagnetic resonance
Optical band gaps
electron paramagnetic resonance
Photoluminescence
photoluminescence
Hydrogen
low frequencies
Optical emission spectroscopy
Defect density
shift
Infrared absorption
optical emission spectroscopy
silicon films

Keywords

  • Amorphous carbon
  • ESR
  • FT-IR
  • Photoluminescence
  • RF plasma-enhanced CVD

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Engineering(all)

Cite this

Effect of radio frequency power on the properties of hydrogenated amorphous carbon films grown by radio frequency plasma-enhanced chemical vapor deposition. / Hayashi, Yasuhiko; Hagimoto, Kouji; Ebisu, Hiroshi; Kalaga, Murali Krishna; Soga, Tetsuo; Umeno, Masayoshi; Jimbo, Takashi.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 39, No. 7 A, 2000, p. 4088-4093.

Research output: Contribution to journalArticle

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