Effect of hydrogen on chemical vapor deposition growth of graphene on Au substrates

Tomo O. Terasawa, Takanobu Taira, Satoshi Yasuda, Seiji Obata, Koichiro Saiki, Hidehito Asaoka

Research output: Contribution to journalArticle

Abstract

Chemical vapor deposition (CVD) on substrates with low C solubility such as Cu and Au is promising to grow monolayer graphene selectively in a large scale. Hydrogen is often added to control the domain size of graphene on Cu, while Au does not require H2 since Ar is inert against oxidation. The effect of H2 should be revealed to improve the quality of graphene on Au. Here we report the effect of H2 on the CVD growth of graphene on Au substrates using in situ radiation-mode optical microscopy. The in situ observation and ex situ Raman spectroscopy revealed that whether H2 was supplied or not strongly affected the growth rate, thermal radiation contrast, and compressive strain of graphene on Au. We attributed these features to the surface reconstruction of Au(001) depending on H2 supply. Our results are essential to achieve the graphene growth with high quality on Au for future applications.

Original languageEnglish
Article numberSIIB17
JournalJapanese Journal of Applied Physics
Volume58
Issue numberSI
DOIs
Publication statusPublished - Jan 1 2019
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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