Effect of deposition conditions and buffer layers on amorphous or polytype phase formation in Al2O3 thin films by chemical vapor deposition using tri-methyl aluminum

Chunfu Lin, Takashi Tanaka, Akio Nishiyama, Tadashi Shiota, Osamu Sakurai, Naoki Wakiya, Kazuo Shinozaki, Kouichi Yasuda

Research output: Contribution to journalArticle

Abstract

Al2O3 thin films were deposited on (001)Si substrate through Cr2O3/yttria-stabilized-zirconia (YSZ) buffer layer by cold-wall type chemical vapor deposition method with tri-methyl aluminum as a raw material. By changing the deposition temperature, different polytypes of Al2O3 thin films were formed. At lower temperatures (11231173 K),

Original languageEnglish
Pages (from-to)443-450
Number of pages8
JournalJournal of the Ceramic Society of Japan
Volume127
Issue number6
DOIs
Publication statusPublished - Jun 1 2019
Externally publishedYes

Fingerprint

Buffer layers
Aluminum
Chemical vapor deposition
buffers
vapor deposition
aluminum
cold walls
Thin films
Yttria stabilized zirconia
thin films
yttria-stabilized zirconia
Raw materials
Temperature
Substrates
temperature

Keywords

  • Alumina
  • Buffer layer
  • CVD
  • Epitaxial growth
  • Polytype
  • Thin film

ASJC Scopus subject areas

  • Ceramics and Composites
  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Chemistry

Cite this

Effect of deposition conditions and buffer layers on amorphous or polytype phase formation in Al2O3 thin films by chemical vapor deposition using tri-methyl aluminum. / Lin, Chunfu; Tanaka, Takashi; Nishiyama, Akio; Shiota, Tadashi; Sakurai, Osamu; Wakiya, Naoki; Shinozaki, Kazuo; Yasuda, Kouichi.

In: Journal of the Ceramic Society of Japan, Vol. 127, No. 6, 01.06.2019, p. 443-450.

Research output: Contribution to journalArticle

Lin, Chunfu ; Tanaka, Takashi ; Nishiyama, Akio ; Shiota, Tadashi ; Sakurai, Osamu ; Wakiya, Naoki ; Shinozaki, Kazuo ; Yasuda, Kouichi. / Effect of deposition conditions and buffer layers on amorphous or polytype phase formation in Al2O3 thin films by chemical vapor deposition using tri-methyl aluminum. In: Journal of the Ceramic Society of Japan. 2019 ; Vol. 127, No. 6. pp. 443-450.
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AU - Shiota, Tadashi

AU - Sakurai, Osamu

AU - Wakiya, Naoki

AU - Shinozaki, Kazuo

AU - Yasuda, Kouichi

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