Dynamics of consolidation and crack growth in nanocluster-assembled amorphous silicon nitride

Kenji Tsuruta, Aiichiro Nakano, Rajiv K. Kalia, Priya Vashishta

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

Consolidation and fracture dynamics in nanophase amorphous Si3N4 are investigated using 106-atom molecular-dynamics simulations. At a pressure of 15 GPa and 2000 K, the nanophase system is almost fully consolidated within a fraction of a nanosecond. The consolidation process is well-described by the classical theory of sintering. Under an applied strain the consolidated system develops several cracks which propagate parallel to each other, causing failure at multiple sites. The critical strain at which the nanophase system fractures is much larger than that for crystalline Si3N4.

Original languageEnglish
Pages (from-to)433-436
Number of pages4
JournalJournal of the American Ceramic Society
Volume81
Issue number2
Publication statusPublished - Feb 1998
Externally publishedYes

Fingerprint

Nanoclusters
Amorphous silicon
Silicon nitride
Consolidation
Crack propagation
Molecular dynamics
Sintering
Crystalline materials
Cracks
Atoms
Computer simulation
silicon nitride

ASJC Scopus subject areas

  • Ceramics and Composites

Cite this

Dynamics of consolidation and crack growth in nanocluster-assembled amorphous silicon nitride. / Tsuruta, Kenji; Nakano, Aiichiro; Kalia, Rajiv K.; Vashishta, Priya.

In: Journal of the American Ceramic Society, Vol. 81, No. 2, 02.1998, p. 433-436.

Research output: Contribution to journalArticle

Tsuruta, Kenji ; Nakano, Aiichiro ; Kalia, Rajiv K. ; Vashishta, Priya. / Dynamics of consolidation and crack growth in nanocluster-assembled amorphous silicon nitride. In: Journal of the American Ceramic Society. 1998 ; Vol. 81, No. 2. pp. 433-436.
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