The three-phase contact line motion on a superhydrophobic surface through particle-laden sessile droplet evaporation was investigated. Sample surfaces with micro- and nanoscale structures were generated by various durations of chemical treatment and SiO2 spherical particles with different sizes were used as additives of test liquid. The contact angle and contact radius profiles were studied, and the discontinuous motion of those profiles on micro- and nanostructured hierarchical surfaces was observed, while it was not observed on a nanostructured superhydrophobic surface. Suspensions with low particle concentration induced a relatively large contact radius jump compared to the high-concentrated condition; in contrast, the previous report showed the opposite trend for flat surfaces. In order to explain this result, a simple explanation was provided - that the stacked particles at the contact line region suppressed to the deformation of the liquid-vapor interface near the contact line. This is confirmed by side-view images of the deposition results because the contact line region after evaporation of the dense suspension showed a large contact angle compared to that of the diluted suspension. In addition, deposition at the contact line region was observed by scanning electron microscopy to discuss the effect of the characteristic length scale of the surface structure and particles on the contact line motion. We believe that these results will help one to understand the deposition phenomenon during particle-laden droplet evaporation on the superhydrophobic surface and its applications such as evaporation-driven materials deposition.
ASJC Scopus subject areas
- Statistical and Nonlinear Physics
- Statistics and Probability
- Condensed Matter Physics