Development of novel advanced oxidation system using combined UV/H2O2 technique and kinetic analysis for decomposition of dye solutions

Koreyoshi Imamura; Atsuhiro Hiramatsu; Masanori Imada; Takaharu Sakiyama; Atsumi Tanaka; Yosuke Yamada; Kazuhiro Nakanishi

doi:10.1252/jcej.33.253

Development of novel advanced oxidation system using combined UV/H₂O₂ technique and kinetic analysis for decomposition of dye solutions

Koreyoshi Imamura, Atsuhiro Hiramatsu, Masanori Imada, Takaharu Sakiyama, Atsumi Tanaka, Yosuke Yamada, Kazuhiro Nakanishi

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

A novel advanced oxidation system using a combined UV/H₂O₂ technique was constructed for application to wastewater treatment. In this system, wastewater containing H₂O₂ flows along a channel with a flat surface in a thin film, onto which surface UV rays with a wavelength of 253.7 nm are irradiated. As a model wastewater, we used various dye solutions and investigated decoloration rates under various conditions differing in H₂O₂ concentration, temperature, UV illuminance, and so on. Based on the model, which takes into consideration the formation as well as the disappearance rate of hydroxyl radical (·OH), distribution of UV illuminance along the depth of the flow, and the rate of reaction between dye and ·OH, we could simulate the course of dye decomposition. Furthermore, we showed the existence of an optimum H₂O₂ concentration for decomposition on the basis of this model.

Original language	English
Pages (from-to)	253-261
Number of pages	9
Journal	JOURNAL OF CHEMICAL ENGINEERING OF JAPAN
Volume	33
Issue number	2
DOIs	https://doi.org/10.1252/jcej.33.253
Publication status	Published - Jan 1 2000

Keywords

Decoloration
Dye
Hydrogen peroxide
Radical oxidation
Ultraviolet ray

ASJC Scopus subject areas

Chemistry(all)
Chemical Engineering(all)

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Development of novel advanced oxidation system using combined UV/H₂O₂ technique and kinetic analysis for decomposition of dye solutions. / Imamura, Koreyoshi; Hiramatsu, Atsuhiro; Imada, Masanori; Sakiyama, Takaharu; Tanaka, Atsumi; Yamada, Yosuke; Nakanishi, Kazuhiro.

In: JOURNAL OF CHEMICAL ENGINEERING OF JAPAN, Vol. 33, No. 2, 01.01.2000, p. 253-261.

Research output: Contribution to journal › Article › peer-review

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abstract = "A novel advanced oxidation system using a combined UV/H2O2 technique was constructed for application to wastewater treatment. In this system, wastewater containing H2O2 flows along a channel with a flat surface in a thin film, onto which surface UV rays with a wavelength of 253.7 nm are irradiated. As a model wastewater, we used various dye solutions and investigated decoloration rates under various conditions differing in H2O2 concentration, temperature, UV illuminance, and so on. Based on the model, which takes into consideration the formation as well as the disappearance rate of hydroxyl radical (·OH), distribution of UV illuminance along the depth of the flow, and the rate of reaction between dye and ·OH, we could simulate the course of dye decomposition. Furthermore, we showed the existence of an optimum H2O2 concentration for decomposition on the basis of this model.",

keywords = "Decoloration, Dye, Hydrogen peroxide, Radical oxidation, Ultraviolet ray",

author = "Koreyoshi Imamura and Atsuhiro Hiramatsu and Masanori Imada and Takaharu Sakiyama and Atsumi Tanaka and Yosuke Yamada and Kazuhiro Nakanishi",

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AU - Sakiyama, Takaharu

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AU - Yamada, Yosuke

AU - Nakanishi, Kazuhiro

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