Development of EUV light source by laser-produced plasma

Y. Izawa, N. Miyanaga, H. Nishimura, S. Fujioka, T. Aota, Y. Tao, S. Uchida, Y. Shimada, K. Hashimoto, M. Yamaura, K. Nishihara, M. Murakami, A. Sunahara, H. Furukawa, A. Sasaki, W. Nishikawa, H. Tanuma, T. Norimatsu, K. Nagai, Q. GuM. Nakatsuka, H. Fujita, K. Tsubakimoto, H. Yoshida, K. Mima

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We have been developing an EUV light source by laser-produced plasma for the use of EUV lithography system under the Leading Project promoted by MEXT. The project aims at understanding physics of laser plasma EUV source and providing database and guidelines for the practical EUV source. Progresses in theoretical modeling and experimental results are briefly reported.

Original languageEnglish
Title of host publicationProceedings - IFSA 2005
Subtitle of host publicationInertial Fusion Sciences and Applications 2005
Pages1161-1165
Number of pages5
DOIs
Publication statusPublished - Jun 2006
EventIFSA 2005: Inertial Fusion Sciences and Applications 2005 - Biarritz, France
Duration: Sep 4 2005Sep 9 2005

Publication series

NameJournal De Physique. IV : JP
Volume133
ISSN (Print)1155-4339
ISSN (Electronic)1764-7177

Other

OtherIFSA 2005: Inertial Fusion Sciences and Applications 2005
CountryFrance
CityBiarritz
Period9/4/059/9/05

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Development of EUV light source by laser-produced plasma'. Together they form a unique fingerprint.

Cite this