Detection of photon emission during crack propagation in silica glass by fast time-resolved measurement

Yoshitaka Sato, Tadashi Shiota, Kouichi Yasuda

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Fast time-resolved measurement was carried out to detect photon emission (PE) during crack propagation in silica glass. The specimen was fractured by three-point bending at room temperature under 10 -4 Pa. The top and bottom surfaces of the specimen were coated with Au. Resistance of those surfaces was monitored to detect crack propagation in the specimen. Simultaneously, the PE was detected with photomultiplier tube. The PE around 650 nm increased and then gradually decreased during the crack propagation, while the strong the PE around 450 nm was observed at the beginning of the crack propagation. Moreover, both of the emissions started just before the onset of the crack propagation. It might be due to micro-cracks leading to a main crack propagation. The result suggests that a fracture precursor can be detected by monitoring the PE.

Original languageEnglish
Pages (from-to)1028-1031
Number of pages4
JournalNihon Kikai Gakkai Ronbunshu, A Hen/Transactions of the Japan Society of Mechanical Engineers, Part A
Volume77
Issue number779
DOIs
Publication statusPublished - Dec 1 2011
Externally publishedYes

Fingerprint

Fused silica
Time measurement
Crack propagation
Photons
Photomultipliers
Cracks
Monitoring

Keywords

  • Brittle fracture
  • Crack propagation
  • Photon emission
  • Silica glass

ASJC Scopus subject areas

  • Mechanical Engineering
  • Mechanics of Materials
  • Materials Science(all)

Cite this

@article{29d90f565f7346f98930a179ed2782cb,
title = "Detection of photon emission during crack propagation in silica glass by fast time-resolved measurement",
abstract = "Fast time-resolved measurement was carried out to detect photon emission (PE) during crack propagation in silica glass. The specimen was fractured by three-point bending at room temperature under 10 -4 Pa. The top and bottom surfaces of the specimen were coated with Au. Resistance of those surfaces was monitored to detect crack propagation in the specimen. Simultaneously, the PE was detected with photomultiplier tube. The PE around 650 nm increased and then gradually decreased during the crack propagation, while the strong the PE around 450 nm was observed at the beginning of the crack propagation. Moreover, both of the emissions started just before the onset of the crack propagation. It might be due to micro-cracks leading to a main crack propagation. The result suggests that a fracture precursor can be detected by monitoring the PE.",
keywords = "Brittle fracture, Crack propagation, Photon emission, Silica glass",
author = "Yoshitaka Sato and Tadashi Shiota and Kouichi Yasuda",
year = "2011",
month = "12",
day = "1",
doi = "10.1299/kikaia.77.1028",
language = "English",
volume = "77",
pages = "1028--1031",
journal = "Nihon Kikai Gakkai Ronbunshu, A Hen/Transactions of the Japan Society of Mechanical Engineers, Part A",
issn = "0387-5008",
publisher = "Japan Society of Mechanical Engineers",
number = "779",

}

TY - JOUR

T1 - Detection of photon emission during crack propagation in silica glass by fast time-resolved measurement

AU - Sato, Yoshitaka

AU - Shiota, Tadashi

AU - Yasuda, Kouichi

PY - 2011/12/1

Y1 - 2011/12/1

N2 - Fast time-resolved measurement was carried out to detect photon emission (PE) during crack propagation in silica glass. The specimen was fractured by three-point bending at room temperature under 10 -4 Pa. The top and bottom surfaces of the specimen were coated with Au. Resistance of those surfaces was monitored to detect crack propagation in the specimen. Simultaneously, the PE was detected with photomultiplier tube. The PE around 650 nm increased and then gradually decreased during the crack propagation, while the strong the PE around 450 nm was observed at the beginning of the crack propagation. Moreover, both of the emissions started just before the onset of the crack propagation. It might be due to micro-cracks leading to a main crack propagation. The result suggests that a fracture precursor can be detected by monitoring the PE.

AB - Fast time-resolved measurement was carried out to detect photon emission (PE) during crack propagation in silica glass. The specimen was fractured by three-point bending at room temperature under 10 -4 Pa. The top and bottom surfaces of the specimen were coated with Au. Resistance of those surfaces was monitored to detect crack propagation in the specimen. Simultaneously, the PE was detected with photomultiplier tube. The PE around 650 nm increased and then gradually decreased during the crack propagation, while the strong the PE around 450 nm was observed at the beginning of the crack propagation. Moreover, both of the emissions started just before the onset of the crack propagation. It might be due to micro-cracks leading to a main crack propagation. The result suggests that a fracture precursor can be detected by monitoring the PE.

KW - Brittle fracture

KW - Crack propagation

KW - Photon emission

KW - Silica glass

UR - http://www.scopus.com/inward/record.url?scp=84856495030&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84856495030&partnerID=8YFLogxK

U2 - 10.1299/kikaia.77.1028

DO - 10.1299/kikaia.77.1028

M3 - Article

AN - SCOPUS:84856495030

VL - 77

SP - 1028

EP - 1031

JO - Nihon Kikai Gakkai Ronbunshu, A Hen/Transactions of the Japan Society of Mechanical Engineers, Part A

JF - Nihon Kikai Gakkai Ronbunshu, A Hen/Transactions of the Japan Society of Mechanical Engineers, Part A

SN - 0387-5008

IS - 779

ER -