Deposition of amorphous CNx by d.c. and rf plasma sputtering using a rf radical nitrogen beam source

Y. Hayashi, M. M. Rahman, K. Kaneko, T. Soga, M. Umeno, T. Jimbo

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Fingerprint

Dive into the research topics of 'Deposition of amorphous CN<sub>x</sub> by d.c. and rf plasma sputtering using a rf radical nitrogen beam source'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemical Compounds