Charging Simulation of Micro-structured Pattern in Ion Implantation

Shigeki Sakai, Hiroshi Tsuji, Yasuhito Gotoh, Yoshitaka Toyota, Junzo Ishikawa, Masayasu Tanjyo, Koji Matsuda

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)228-230
Number of pages3
JournalShinku
Volume38
Issue number3
DOIs
Publication statusPublished - 1995
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

Cite this

Sakai, S., Tsuji, H., Gotoh, Y., Toyota, Y., Ishikawa, J., Tanjyo, M., & Matsuda, K. (1995). Charging Simulation of Micro-structured Pattern in Ion Implantation. Shinku, 38(3), 228-230. https://doi.org/10.3131/jvsj.38.228