Characterization of amorphous tungsten trioxide thin films prepared by rf magnetron sputtering method

Tokuro Nanba, Tadashi Takahashi, Jun Takada, Akiyoshi Osaka, Yoshinari Miura, Itaru Yasui, Akira Kishimoto, Tetsuichi Kudo

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Amorphous tungsten trioxide thin films were prepared using a rf magnetron sputtering method. The relation between structure and electrochromic properties was investigated. At the macroscopic level, the films had dense structures. From Raman spectroscopic and X-ray radial distribution analyses, it was deduced that the networks were basically formed by three-, four- and six-membered rings of corner-sharing WO6 octahedra, and in the films with low O/W atomic ratios many edge-sharing units were present. It was also found that the films with high O/W ratios showed good electrochromic properties, which were closely related to the six-membered rings.

Original languageEnglish
Pages (from-to)233-237
Number of pages5
JournalJournal of Non-Crystalline Solids
Issue numberC
Publication statusPublished - Nov 3 1994


ASJC Scopus subject areas

  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials

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